Issued Patents 2016
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9524889 | Processing systems and apparatus adapted to process substrates in electronic device manufacturing | Steve Hongkham, Paul B. Reuter, Eric A. Englhardt, Ganesh Balasubramanian, JuanCarlos Rocha-Alvarez | 2016-12-20 |
| 9520301 | Etching method using plasma, and method of fabricating semiconductor device including the etching method | Go-jun Kim, Vladimir Volynets, Sang Jin An, Hee-jeon Yang, Sang Heon Lee +2 more | 2016-12-13 |
| 9502218 | RPS assisted RF plasma source for semiconductor processing | Saurabh Garg, Jang-Gyoo Yang | 2016-11-22 |
| 9449850 | Processing systems and methods for halide scavenging | Anchuan Wang, Zihui Li, Hiroshi Hamana, Zhijun Chen, Ching-Mei Hsu +5 more | 2016-09-20 |
| 9384997 | Dry-etch selectivity | He Ren, Jang-Gyoo Yang, Jonghoon Baek, Anchuan Wang, Soonam Park +2 more | 2016-07-05 |
| 9373517 | Semiconductor processing with DC assisted RF power for improved control | Jang-Gyoo Yang, Soonam Park, Jonghoon Baek, Saurabh Garg, Shankar Venkataraman | 2016-06-21 |
| 9362130 | Enhanced etching processes using remote plasma sources | Nitin K. Ingle, Dmitry Lubomirsky, Shankar Venkataraman | 2016-06-07 |
| 9267739 | Pedestal with multi-zone temperature control and multiple purge capabilities | Jang-Gyoo Yang, Alexander Tam, Elisha Tam | 2016-02-23 |