| 9497716 |
Control method and electronic device |
Liming Wang |
2016-11-15 |
| 9478432 |
Silicon oxide selective removal |
Anchuan Wang, Nitin K. Ingle |
2016-10-25 |
| 9449245 |
Method and device for detecting straight line |
Baichao Wang, Lin Wang |
2016-09-20 |
| 9449845 |
Selective titanium nitride etching |
Jie Liu, Jingchun Zhang, Anchuan Wang, Nitin K. Ingle, Seung Ho Park +1 more |
2016-09-20 |
| 9449850 |
Processing systems and methods for halide scavenging |
Anchuan Wang, Xinglong Chen, Zihui Li, Hiroshi Hamana, Ching-Mei Hsu +5 more |
2016-09-20 |
| 9437451 |
Radical-component oxide etch |
Jingchun Zhang, Ching-Mei Hsu, Seung Ho Park, Anchuan Wang, Nitin K. Ingle |
2016-09-06 |
| 9406523 |
Highly selective doped oxide removal method |
Zihui Li, Nitin K. Ingle, Anchuan Wang, Shankar Venkataraman |
2016-08-02 |
| 9390937 |
Silicon-carbon-nitride selective etch |
Jingchun Zhang, Anchuan Wang, Nitin K. Ingle |
2016-07-12 |
| 9355863 |
Non-local plasma oxide etch |
Seung Ho Park, Mikhail Korolik, Anchuan Wang, Nitin K. Ingle |
2016-05-31 |
| 9349605 |
Oxide etch selectivity systems and methods |
Lin Xu, Anchuan Wang, Son T. Nguyen |
2016-05-24 |