Issued Patents 2016
Showing 25 most recent of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9530674 | Method and system for three-dimensional (3D) structure fill | Ellie Yieh, Srinivas D. Nemani, Er-Xuan Ping, Gary E. Dickerson | 2016-12-27 |
| 9528185 | Plasma uniformity control by arrays of unit cell plasmas | Sang Ki Nam, Tae Seung Cho, Srinivas D. Nemani | 2016-12-27 |
| 9520267 | Bias voltage frequency controlled angular ion distribution in plasma processing | Jun Xue, Prashanth Kothnur, Umesh M. Kelkar, Matthew D. Scotney-Castle | 2016-12-13 |
| 9512517 | Multiple exposure treatment for processing a patterning feature | Tristan Y. Ma, Maureen Petterson, John Hautala | 2016-12-06 |
| 9515166 | Selective atomic layer deposition process utilizing patterned self assembled monolayers for 3D structure semiconductor applications | Srinivas D. Nemani, Ellie Yieh, Yin Fan | 2016-12-06 |
| 9514918 | Guard aperture to control ion angular distribution in plasma processing | Sang Ki Nam | 2016-12-06 |
| 9502258 | Anisotropic gap etch | Jun Xue, Ching-Mei Hsu, Zihui Li, Anchuan Wang, Nitin K. Ingle | 2016-11-22 |
| 9502262 | Nanocrystalline diamond carbon film for 3D NAND hardmask application | Yongmei Chen, Christopher S. Ngai, Jingjing Liu, Jun Xue, Chentsau Ying | 2016-11-22 |
| 9480140 | Material modification by neutral beam source with selected collision angle | Sang Ki Nam | 2016-10-25 |
| 9460961 | Techniques and apparatus for anisotropic metal etching | Thomas R. Omstead, Tristan Y. Ma | 2016-10-04 |
| 9425027 | Methods of affecting material properties and applications therefor | Christopher R. Hatem, Deepak A. Ramappa, Xianfeng Lu, Anthony Renau, Patrick M. Martin | 2016-08-23 |
| 9412613 | Development of high etch selective hardmask material by ion implantation into amorphous carbon films | Pramit Manna, Abhijit Basu Mallick, Yongmei Chen, Jun Xue, Mukund Srinivasan +2 more | 2016-08-09 |
| 9396965 | Techniques and apparatus for anisotropic metal etching | Tristan Y. Ma, Thomas R. Omstead | 2016-07-19 |
| 9385219 | Method and apparatus for selective deposition | Ellie Yieh, Srinivas D. Nemani, Yin Fan, Tristan Y. Ma | 2016-07-05 |
| 9382625 | Remote plasma source based cyclic CVD process for nanocrystalline diamond deposition | Jun Xue, Jingjing Liu, Yongmei Chen, Chentsau Ying, Shambhu N. Roy | 2016-07-05 |
| 9377692 | Electric/magnetic field guided acid diffusion | Peng Xie, Tristan Y. Ma, Joseph C. Olson, Christopher Dennis Bencher | 2016-06-28 |
| 9379021 | Method to reduce K value of dielectric layer for advanced FinFET formation | Ellie Yieh, Srinivas D. Nemani | 2016-06-28 |
| 9366966 | Electric/magnetic field guided acid profile control in a photoresist layer | Peng Xie | 2016-06-14 |
| 9340877 | Method and system for modifying photoresist using electromagnetic radiation and ion implantation | Patrick M. Martin | 2016-05-17 |
| 9336998 | Apparatus and method for dynamic control of ion beam energy and angle | Daniel Distaso, Nini Munoz, Tristan Y. Ma, Yu-Kang Liu | 2016-05-10 |
| 9293301 | In situ control of ion angular distribution in a processing apparatus | Costel Biloiu, Nini Munoz, Anthony Renau | 2016-03-22 |
| 9288889 | Apparatus and techniques for energetic neutral beam processing | Svetlana B. Radovanov, Bon-Woong Koo, Peter F. Kurunczi | 2016-03-15 |
| 9280070 | Field guided exposure and post-exposure bake process | Peng Xie | 2016-03-08 |
| 9268228 | Techniques for patterning a substrate | Tristan Y. Ma | 2016-02-23 |
| 9253868 | Neutral beam source with plasma sheath-shaping neutralization grid | Sang Ki Nam | 2016-02-02 |