Issued Patents 2016
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9530674 | Method and system for three-dimensional (3D) structure fill | Ludovic Godet, Srinivas D. Nemani, Er-Xuan Ping, Gary E. Dickerson | 2016-12-27 |
| 9515166 | Selective atomic layer deposition process utilizing patterned self assembled monolayers for 3D structure semiconductor applications | Srinivas D. Nemani, Ludovic Godet, Yin Fan | 2016-12-06 |
| 9484202 | Apparatus and methods for spacer deposition and selective removal in an advanced patterning process | Jie Zhou, Chentsau Ying, Shambhu N. Roy, Srinivas D. Nemani, Jingjing Liu | 2016-11-01 |
| 9484274 | Methods for reducing semiconductor substrate strain variation | Christopher Dennis Bencher, Ehud Tzuri | 2016-11-01 |
| 9412613 | Development of high etch selective hardmask material by ion implantation into amorphous carbon films | Pramit Manna, Abhijit Basu Mallick, Ludovic Godet, Yongmei Chen, Jun Xue +2 more | 2016-08-09 |
| 9406522 | Single platform, multiple cycle spacer deposition and etch | Hao Chen, Chentsau Ying, Srinivas D. Nemani | 2016-08-02 |
| 9385219 | Method and apparatus for selective deposition | Srinivas D. Nemani, Ludovic Godet, Yin Fan, Tristan Y. Ma | 2016-07-05 |
| 9379021 | Method to reduce K value of dielectric layer for advanced FinFET formation | Ludovic Godet, Srinivas D. Nemani | 2016-06-28 |