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Methods for reducing semiconductor substrate strain variation |
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Optically tuned hardmask for multi-patterning applications |
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Resist hardening and development processes for semiconductor device manufacturing |
Peng Xie, Huixiong Dai, Timothy Michaelson, Subhash Deshmukh |
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| 9395631 |
Multi-beam pattern generators employing yaw correction when writing upon large substrates, and associated methods |
— |
2016-07-19 |
| 9383649 |
Digital grey tone lithography for 3D pattern formation |
— |
2016-07-05 |
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Electric/magnetic field guided acid diffusion |
Peng Xie, Ludovic Godet, Tristan Y. Ma, Joseph C. Olson |
2016-06-28 |
| 9337051 |
Method for critical dimension reduction using conformal carbon films |
Bencherki Mebarki, Bok Hoen Kim, Deenesh Padhi, Li Yan Miao, Pramit Manna +4 more |
2016-05-10 |
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Technique for selectively processing three dimensional device |
Nilay A. Pradhan, Benjamin Colombeau, Naushad K. Variam, Mandar B. Pandit, Adam Brand |
2016-05-10 |
