Issued Patents 2002
Showing 26–50 of 52 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6441349 | System for facilitating uniform heating temperature of photoresist | Bharath Rangarajan, Sanjay K. Yedur | 2002-08-27 |
| 6439963 | System and method for mitigating wafer surface disformation during chemical mechanical polishing (CMP) | Bharath Rangarajan, Ursula Q. Quinto | 2002-08-27 |
| 6440289 | Method for improving seed layer electroplating for semiconductor | Christy Mei-Chu Woo, Bharath Rangarajan | 2002-08-27 |
| 6437329 | Use of carbon nanotubes as chemical sensors by incorporation of fluorescent molecules within the tube | Sanjay K. Yedur, Bryan K. Choo | 2002-08-20 |
| 6429141 | Method of manufacturing a semiconductor device with improved line width accuracy | Minh Van Ngo, Dawn Hopper, Carmen Morales | 2002-08-06 |
| 6424039 | Dual damascene process using sacrificial spin-on materials | Fei Wang, James Kai | 2002-07-23 |
| 6422918 | Chemical-mechanical polishing of photoresist layer | Steven C. Avanzino, Bharath Rangarajan, Alvin M. Dangca | 2002-07-23 |
| 6423650 | Ultra-thin resist coating quality by increasing surface roughness of the substrate | Marina V. Plat, Christopher F. Lyons, Michael K. Templeton | 2002-07-23 |
| 6423479 | Cleaning carbon contamination on mask using gaseous phase | Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Sanjay K. Yedur, Bryan K. Choo | 2002-07-23 |
| 6420702 | Non-charging critical dimension SEM metrology standard | Nicholas H. Tripsas, Michael K. Templeton | 2002-07-16 |
| 6416933 | Method to produce small space pattern using plasma polymerization layer | Bharath Rangarajan, Wenge Yang | 2002-07-09 |
| 6417084 | T-gate formation using a modified conventional poly process | Marina V. Plat, Ramkumar Subramanian, Christopher F. Lyons | 2002-07-09 |
| 6413857 | Method of creating ground to avoid charging in SOI products | Ramkumar Subramanian, Bharath Rangarajan | 2002-07-02 |
| 6403456 | T or T/Y gate formation using trim etch processing | Marina V. Plat, Christopher F. Lyons, Ramkumar Subramanian | 2002-06-11 |
| 6403500 | Cross-shaped resist dispensing system and method | James Yu, Kouros Ghandehari | 2002-06-11 |
| 6396059 | Using a crystallographic etched silicon sample to measure and control the electron beam width of a SEM | Bryan K. Choo, Sanjay K. Yedur | 2002-05-28 |
| 6383947 | Anti-reflective coating used in the fabrication of microcircuit structures in 0.18 micron and smaller technologies | Paul R. Besser, Darrell M. Erb, Susan H. Chen, Carmen Morales | 2002-05-07 |
| 6383952 | RELACS process to double the frequency or pitch of small feature formation | Ramkumar Subramanian, Marina V. Plat, Christopher F. Lyons, Scott A. Bell | 2002-05-07 |
| 6376013 | Multiple nozzles for dispensing resist | Bharath Rangarajan, Sanjay K. Yedur, Michael K. Templeton | 2002-04-23 |
| 6371134 | Ozone cleaning of wafers | Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Sanjay K. Yedur, Bryan K. Choo | 2002-04-16 |
| 6373053 | Analysis of CD-SEM signal to detect scummed/closed contact holes and lines | Bryan K. Choo, Sanjay K. Yedur, Khoi A. Phan | 2002-04-16 |
| 6372614 | Dual damascene method for backened metallization using poly stop layers | Bharath Rangarajan, Ramkumar Subramanian | 2002-04-16 |
| 6358843 | Method of making ultra small vias for integrated circuits | Carl P. Babcock | 2002-03-19 |
| 6354133 | Use of carbon nanotubes to calibrate conventional tips used in AFM | Sanjay K. Yedur, Bryan K. Choo, Michael K. Templeton, Ramkumar Subramanian | 2002-03-12 |
| 6352817 | Methodology for mitigating formation of t-tops in photoresist | Bharath Rangarajan, Steven C. Avanzino | 2002-03-05 |