Issued Patents 2002
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6500756 | Method of forming sub-lithographic spaces between polysilicon lines | Philip A. Fisher, Richard Nguyen, Cyrus E. Tabery | 2002-12-31 |
| 6458606 | Etch bias distribution across semiconductor wafer | Marina V. Plat, Luigi Capodieci, Todd P. Lukanc | 2002-10-01 |
| 6440640 | Thin resist with transition metal hard mask for via etch application | Chih-Yuh Yang, Christopher F. Lyons, Harry J. Levinson, Khanh B. Nguyen, Fei Wang | 2002-08-27 |
| 6423457 | In-situ process for monitoring lateral photoresist etching | — | 2002-07-23 |
| 6420097 | Hardmask trim process | Christopher Lee Pike | 2002-07-16 |
| 6383952 | RELACS process to double the frequency or pitch of small feature formation | Ramkumar Subramanian, Bhanwar Singh, Marina V. Plat, Christopher F. Lyons | 2002-05-07 |
| 6380588 | Semiconductor device having uniform spacers | William G. En, Minh Van Ngo, Chih-Yuk Yang, David K. Foote, Olov Karlsson +1 more | 2002-04-30 |
| 6340603 | Plasma emission detection during lateral processing of photoresist mask | — | 2002-01-22 |