Issued Patents 2002
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6451647 | Integrated plasma etch of gate and gate dielectric and low power plasma post gate etch removal of high-K residual | Minh Van Ngo | 2002-09-17 |
| 6440640 | Thin resist with transition metal hard mask for via etch application | Christopher F. Lyons, Harry J. Levinson, Khanh B. Nguyen, Fei Wang, Scott A. Bell | 2002-08-27 |