Issued Patents 2002
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6492067 | Removable pellicle for lithographic mask protection and handling | Leonard E. Klebanoff, Daniel J. Rader, Scott D. Hector, Richard H. Stulen | 2002-12-10 |
| 6440640 | Thin resist with transition metal hard mask for via etch application | Chih-Yuh Yang, Christopher F. Lyons, Harry J. Levinson, Fei Wang, Scott A. Bell | 2002-08-27 |
| 6414326 | Technique to separate dose-induced vs. focus-induced CD or linewidth variation | — | 2002-07-02 |
| 6370680 | Device to determine line edge roughness effect on device performance | — | 2002-04-09 |