Issued Patents 2002
Showing 1–25 of 52 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6500587 | Binary and attenuating phase-shifting masks for multiple wavelengths | Kouros Ghandehari, Carl P. Babcock | 2002-12-31 |
| 6501534 | Automated periodic focus and exposure calibration of a lithography stepper | Ramkumar Subramanian, Bharath Rangarajan, Carmen Morales | 2002-12-31 |
| 6501555 | Optical technique to detect etch process termination | Kouros Ghandehari, Angela T. Hui | 2002-12-31 |
| 6486072 | System and method to facilitate removal of defects from a substrate | Khoi A. Phan, Bharath Rangarajan | 2002-11-26 |
| 6486078 | Super critical drying of low k materials | Bharath Rangarajan, Ramkumar Subramanian | 2002-11-26 |
| 6482558 | Conducting electron beam resist thin film layer for patterning of mask plates | Ramkumar Subramanian, Bharath Rangarajan | 2002-11-19 |
| 6478484 | Feed-forward mechanism from latent images to developer system for photoresist linewidth control | — | 2002-11-12 |
| 6479817 | Cantilever assembly and scanning tip therefor with associated optical sensor | Sanjay K. Yedur, Bryan K. Choo, Carmen Morales | 2002-11-12 |
| 6479820 | Electrostatic charge reduction of photoresist pattern on development track | Ramkumar Subramanian, Bharath Rangarajan, Khoi A. Phan, Bryan K. Choo | 2002-11-12 |
| 6475867 | Method of forming integrated circuit features by oxidation of titanium hard mask | Angela T. Hui, Kouros Ghandehari | 2002-11-05 |
| 6465156 | Method for mitigating formation of silicon grass | Bharath Rangarajan, Steven C. Avanzino | 2002-10-15 |
| 6458607 | Using UV/VIS spectrophotometry to regulate developer solution during a development process | Bharath Rangarajan, Ramkumar Subramanian | 2002-10-01 |
| 6458691 | Dual inlaid process using an imaging layer to protect via from poisoning | Ramkumar Subramanian, Christopher F. Lyons, Marina V. Plat | 2002-10-01 |
| 6459482 | Grainless material for calibration sample | Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Michael K. Templeton, Sanjay K. Yedur +1 more | 2002-10-01 |
| 6459945 | System and method for facilitating determining suitable material layer thickness in a semiconductor device fabrication process | Carmen Morales, Bharath Rangarajan | 2002-10-01 |
| 6455847 | Carbon nanotube probes in atomic force microscope to detect partially open/closed contacts | Sanjay K. Yedur, Bryan K. Choo | 2002-09-24 |
| 6455416 | Developer soluble dyed BARC for dual damascene process | Ramkumar Subramanian, Bharath Rangarajan, Michael K. Templeton | 2002-09-24 |
| 6455332 | Methodology to mitigate electron beam induced charge dissipation on polysilicon fine patterning | Michael K. Templeton | 2002-09-24 |
| 6451512 | UV-enhanced silylation process to increase etch resistance of ultra thin resists | Bharath Rangarajan, Ramkumar Subramanian, Khoi A. Phan, Michael K. Templeton, Sanjay K. Yedur +1 more | 2002-09-17 |
| 6451621 | Using scatterometry to measure resist thickness and control implant | Bharath Rangarajan, Ramkumar Subramanian | 2002-09-17 |
| 6452161 | Scanning probe microscope having optical fiber spaced from point of hp | Sanjay K. Yedur, Bryan K. Choo, Carmen Morales | 2002-09-17 |
| 6448097 | Measure fluorescence from chemical released during trim etch | Bharath Rangarajan, Ramkumar Subramanian | 2002-09-10 |
| 6444373 | Modification of mask layout data to improve mask fidelity | Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan | 2002-09-03 |
| 6444381 | Electron beam flood exposure technique to reduce the carbon contamination | Ramkumar Subramanian, Michael K. Templeton, Bharath Rangarajan, Khoi A. Phan, Bryan K. Choo +1 more | 2002-09-03 |
| 6445072 | Deliberate void in innerlayer dielectric gapfill to reduce dielectric constant | Ramkumar Subramanian, Michael K. Templeton, Bharath Rangarajan | 2002-09-03 |