Issued Patents 2002
Showing 1–25 of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6501534 | Automated periodic focus and exposure calibration of a lithography stepper | Bhanwar Singh, Ramkumar Subramanian, Carmen Morales | 2002-12-31 |
| 6492075 | Chemical trim process | Michael K. Templeton, Ramkumar Subramanian | 2002-12-10 |
| 6486078 | Super critical drying of low k materials | Ramkumar Subramanian, Bhanwar Singh | 2002-11-26 |
| 6486072 | System and method to facilitate removal of defects from a substrate | Khoi A. Phan, Bhanwar Singh | 2002-11-26 |
| 6486029 | Integration of an ion implant hard mask structure into a process for fabricating high density memory cells | David K. Foote, Stephan K. Park, Fei Wang, Dawn Hopper, Jack F. Thomas +2 more | 2002-11-26 |
| 6482558 | Conducting electron beam resist thin film layer for patterning of mask plates | Bhanwar Singh, Ramkumar Subramanian | 2002-11-19 |
| 6479820 | Electrostatic charge reduction of photoresist pattern on development track | Bhanwar Singh, Ramkumar Subramanian, Khoi A. Phan, Bryan K. Choo | 2002-11-12 |
| 6465156 | Method for mitigating formation of silicon grass | Bhanwar Singh, Steven C. Avanzino | 2002-10-15 |
| 6459482 | Grainless material for calibration sample | Bhanwar Singh, Ramkumar Subramanian, Khoi A. Phan, Michael K. Templeton, Sanjay K. Yedur +1 more | 2002-10-01 |
| 6459945 | System and method for facilitating determining suitable material layer thickness in a semiconductor device fabrication process | Bhanwar Singh, Carmen Morales | 2002-10-01 |
| 6458677 | Process for fabricating an ONO structure | Dawn Hopper, David K. Foote | 2002-10-01 |
| 6458656 | Process for creating a flash memory cell using a photoresist flow operation | Stephen Keetai Park, George J. Kluth | 2002-10-01 |
| 6458607 | Using UV/VIS spectrophotometry to regulate developer solution during a development process | Bhanwar Singh, Ramkumar Subramanian | 2002-10-01 |
| 6455416 | Developer soluble dyed BARC for dual damascene process | Ramkumar Subramanian, Bhanwar Singh, Michael K. Templeton | 2002-09-24 |
| 6451621 | Using scatterometry to measure resist thickness and control implant | Bhanwar Singh, Ramkumar Subramanian | 2002-09-17 |
| 6451512 | UV-enhanced silylation process to increase etch resistance of ultra thin resists | Ramkumar Subramanian, Khoi A. Phan, Bhanwar Singh, Michael K. Templeton, Sanjay K. Yedur +1 more | 2002-09-17 |
| 6448097 | Measure fluorescence from chemical released during trim etch | Bhanwar Singh, Ramkumar Subramanian | 2002-09-10 |
| 6444373 | Modification of mask layout data to improve mask fidelity | Ramkumar Subramanian, Khoi A. Phan, Bhanwar Singh | 2002-09-03 |
| 6445072 | Deliberate void in innerlayer dielectric gapfill to reduce dielectric constant | Ramkumar Subramanian, Bhanwar Singh, Michael K. Templeton | 2002-09-03 |
| 6444381 | Electron beam flood exposure technique to reduce the carbon contamination | Bhanwar Singh, Ramkumar Subramanian, Michael K. Templeton, Khoi A. Phan, Bryan K. Choo +1 more | 2002-09-03 |
| 6441418 | Spacer narrowed, dual width contact for charge gain reduction | Jeffrey A. Shields | 2002-08-27 |
| 6439963 | System and method for mitigating wafer surface disformation during chemical mechanical polishing (CMP) | Bhanwar Singh, Ursula Q. Quinto | 2002-08-27 |
| 6440289 | Method for improving seed layer electroplating for semiconductor | Christy Mei-Chu Woo, Bhanwar Singh | 2002-08-27 |
| 6441349 | System for facilitating uniform heating temperature of photoresist | Bhanwar Singh, Sanjay K. Yedur | 2002-08-27 |
| 6436766 | Process for fabricating high density memory cells using a polysilicon hard mask | David K. Foote, Fei Wang, Dawn Hopper, Stephen Keetai Park, Jack F. Thomas +2 more | 2002-08-20 |