Issued Patents 2002
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6486029 | Integration of an ion implant hard mask structure into a process for fabricating high density memory cells | David K. Foote, Bharath Rangarajan, Stephan K. Park, Fei Wang, Jack F. Thomas +2 more | 2002-11-26 |
| 6482755 | HDP deposition hillock suppression method in integrated circuits | Minh Van Ngo, Robert A. Huertas | 2002-11-19 |
| 6479898 | Dielectric treatment in integrated circuit interconnects | Minh Van Ngo, Joffre F. Bernard | 2002-11-12 |
| 6459155 | Damascene processing employing low Si-SiON etch stop layer/arc | Ramkumar Subramanian, Minh Van Ngo | 2002-10-01 |
| 6458677 | Process for fabricating an ONO structure | David K. Foote, Bharath Rangarajan | 2002-10-01 |
| 6455409 | Damascene processing using a silicon carbide hard mask | Ramkumar Subramanian | 2002-09-24 |
| 6436808 | NH3/N2-plasma treatment to prevent organic ILD degradation | Minh Van Ngo, Jeremy I. Martin | 2002-08-20 |
| 6436766 | Process for fabricating high density memory cells using a polysilicon hard mask | Bharath Rangarajan, David K. Foote, Fei Wang, Stephen Keetai Park, Jack F. Thomas +2 more | 2002-08-20 |
| 6429141 | Method of manufacturing a semiconductor device with improved line width accuracy | Minh Van Ngo, Bhanwar Singh, Carmen Morales | 2002-08-06 |
| 6429121 | Method of fabricating dual damascene with silicon carbide via mask/ARC | Ramkumar Subramanian, Richard J. Huang | 2002-08-06 |
| 6420278 | Method for improving the dielectric constant of silicon-based semiconductor materials | Richard J. Huang, Lu You | 2002-07-16 |
| 6410458 | Method and system for eliminating voids in a semiconductor device | Lu You, John Jianshi Wang | 2002-06-25 |
| 6407009 | Methods of manufacture of uniform spin-on films | Lu You, Richard J. Huang | 2002-06-18 |
| 6406960 | Process for fabricating an ONO structure having a silicon-rich silicon nitride layer | David K. Foote, Bharath Rangarajan, Arvind Halliyal | 2002-06-18 |
| 6399446 | Process for fabricating high density memory cells using a metallic hard mask | Bharath Rangarajan, David K. Foote, Fei Wang, Stephen Keetai Park, Jack F. Thomas +2 more | 2002-06-04 |
| 6395644 | Process for fabricating a semiconductor device using a silicon-rich silicon nitride ARC | Minh Van Ngo, David K. Foote | 2002-05-28 |
| 6388309 | Apparatus and method for manufacturing semiconductors using low dielectric constant materials | Lu You, Richard J. Huang | 2002-05-14 |
| 6388330 | Low dielectric constant etch stop layers in integrated circuit interconnects | Minh Van Ngo, Robert A. Huertas, Terri Jo Kitson | 2002-05-14 |
| 6387825 | Solution flow-in for uniform deposition of spin-on films | Lu You, Richard J. Huang | 2002-05-14 |
| 6348410 | Low temperature hillock suppression method in integrated circuit interconnects | Minh Van Ngo, Robert A. Huertas | 2002-02-19 |
| 6335533 | Electron microscopy sample having silicon nitride passivation layer | Guarionex Morales, Lu You | 2002-01-01 |