Issued Patents 2002
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6492257 | Water vapor plasma for effective low-k dielectric resist stripping | Jeffrey A. Shields, Mohammad R. Rakhshandehroo | 2002-12-10 |
| 6489253 | Method of forming a void-free interlayer dielectric (ILD0) for 0.18-&mgr;m flash memory technology and semiconductor device thereby formed | Minh Van Ngo, Robert A. Huertas, King Wai Kelwin Ko, Pei-Yuan Gao | 2002-12-03 |
| 6465361 | Method for preventing damage of low-k dielectrics during patterning | Steve Avanzino, Fei Wang | 2002-10-15 |
| 6448594 | Method and system for processing a semiconductor device | Maria C. Chan, Hao Fang, Mark S. Chang, King Wai Kelwin Ko | 2002-09-10 |
| 6445051 | Method and system for providing contacts with greater tolerance for misalignment in a flash memory | Mark S. Chang, Hao Fang, King Wai Kelwin Ko, John Jianshi Wang, Michael K. Templeton +1 more | 2002-09-03 |
| 6420278 | Method for improving the dielectric constant of silicon-based semiconductor materials | Dawn Hopper, Richard J. Huang | 2002-07-16 |
| 6417090 | Damascene arrangement for metal interconnection using low k dielectric constant materials for etch stop layer | Fei Wang | 2002-07-09 |
| 6410458 | Method and system for eliminating voids in a semiconductor device | Dawn Hopper, John Jianshi Wang | 2002-06-25 |
| 6407009 | Methods of manufacture of uniform spin-on films | Dawn Hopper, Richard J. Huang | 2002-06-18 |
| 6388309 | Apparatus and method for manufacturing semiconductors using low dielectric constant materials | Dawn Hopper, Richard J. Huang | 2002-05-14 |
| 6387825 | Solution flow-in for uniform deposition of spin-on films | Dawn Hopper, Richard J. Huang | 2002-05-14 |
| 6383925 | Method of improving adhesion of capping layers to cooper interconnects | Minh Van Ngo, Robert A. Huertas, Ercan Adem | 2002-05-07 |
| 6376309 | Method for reduced gate aspect ratio to improve gap-fill after spacer etch | John Jianshi Wang, Kent Kuohua Chang, Hao Fang | 2002-04-23 |
| 6335533 | Electron microscopy sample having silicon nitride passivation layer | Guarionex Morales, Dawn Hopper | 2002-01-01 |