Issued Patents 2002
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6486029 | Integration of an ion implant hard mask structure into a process for fabricating high density memory cells | David K. Foote, Bharath Rangarajan, Stephan K. Park, Fei Wang, Dawn Hopper +2 more | 2002-11-26 |
| 6475847 | Method for forming a semiconductor device with self-aligned contacts using a liner oxide layer | Minh Van Ngo, Yu Sun, Fei Wang, Mark T. Ramsbey, Chi Chang +1 more | 2002-11-05 |
| 6472327 | Method and system for etching tunnel oxide to reduce undercutting during memory array fabrication | King Wai Kelwin Ko, Hao Fang | 2002-10-29 |
| 6448594 | Method and system for processing a semiconductor device | Maria C. Chan, Hao Fang, Lu You, King Wai Kelwin Ko | 2002-09-10 |
| 6444530 | Process for fabricating an integrated circuit with a self-aligned contact | Hung-Sheng Chen, Unsoon Kim, Yu Sun, Chi Chang, Mark T. Ramsbey +4 more | 2002-09-03 |
| 6444539 | Method for producing a shallow trench isolation filled with thermal oxide | Yu Sun, Angela T. Hui, Yue-Song He, Tatsuya Kajita, Chi Chang +1 more | 2002-09-03 |
| 6445051 | Method and system for providing contacts with greater tolerance for misalignment in a flash memory | Hao Fang, King Wai Kelwin Ko, John Jianshi Wang, Michael K. Templeton, Lu You +1 more | 2002-09-03 |
| 6436766 | Process for fabricating high density memory cells using a polysilicon hard mask | Bharath Rangarajan, David K. Foote, Fei Wang, Dawn Hopper, Stephen Keetai Park +2 more | 2002-08-20 |
| 6431182 | Plasma treatment for polymer removal after via etch | Mohammad R. Rakhshandehroo, Angela T. Hui | 2002-08-13 |
| 6420224 | Stepper alignment mark formation with dual field oxide process | Tatsuya Kajita | 2002-07-16 |
| 6420752 | Semiconductor device with self-aligned contacts using a liner oxide layer | Minh Van Ngo, Yu Sun, Fei Wang, Mark T. Ramsbey, Chi Chang +1 more | 2002-07-16 |
| 6400030 | Self-aligning vias for semiconductors | Fei Wang, Robin Cheung, Richard J. Huang, Angela T. Hui | 2002-06-04 |
| 6399446 | Process for fabricating high density memory cells using a metallic hard mask | Bharath Rangarajan, David K. Foote, Fei Wang, Dawn Hopper, Stephen Keetai Park +2 more | 2002-06-04 |