Issued Patents 2002
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6500757 | Method and apparatus for controlling grain growth roughening in conductive stacks | Guarionex Morales | 2002-12-31 |
| 6500768 | Method for selective removal of ONO layer | Jiahua Huang, Jean Y. Yang | 2002-12-31 |
| 6492257 | Water vapor plasma for effective low-k dielectric resist stripping | Lu You, Mohammad R. Rakhshandehroo | 2002-12-10 |
| 6486506 | Flash memory with less susceptibility to charge gain and charge loss | Stephen Keetai Park | 2002-11-26 |
| 6479348 | Method of making memory wordline hard mask extension | Tazrien Kamal, Minh Van Ngo, Mark T. Ramsbey, Jean Y. Yang, Emmanuil Lingunis +2 more | 2002-11-12 |
| 6472751 | H2 diffusion barrier formation by nitrogen incorporation in oxide layer | Robert Chen, Robert Dawson, Khanh Tran | 2002-10-29 |
| 6441418 | Spacer narrowed, dual width contact for charge gain reduction | Bharath Rangarajan | 2002-08-27 |
| 6440874 | High throughput plasma resist strip process for temperature sensitive applications | — | 2002-08-27 |
| 6426301 | Reduction of via etch charging damage through the use of a conducting hard mask | Ramkumar Subramanian, Bharath Rangarajan, Allen S. Yu | 2002-07-30 |
| 6412498 | Low temperature plasma strip process | — | 2002-07-02 |
| 6383945 | High selectivity pad etch for thick topside stacks | Jiahua Huang, Allison Holbrook | 2002-05-07 |
| 6376877 | Double self-aligning shallow trench isolation semiconductor and manufacturing method therefor | Allen S. Yu | 2002-04-23 |
| 6350696 | Spacer etch method for semiconductor device | Jeffrey P. Erhardt | 2002-02-26 |