Issued Patents 2002
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6486072 | System and method to facilitate removal of defects from a substrate | Bharath Rangarajan, Bhanwar Singh | 2002-11-26 |
| 6479820 | Electrostatic charge reduction of photoresist pattern on development track | Bhanwar Singh, Ramkumar Subramanian, Bharath Rangarajan, Bryan K. Choo | 2002-11-12 |
| 6459482 | Grainless material for calibration sample | Bhanwar Singh, Ramkumar Subramanian, Bharath Rangarajan, Michael K. Templeton, Sanjay K. Yedur +1 more | 2002-10-01 |
| 6453916 | Low angle solvent dispense nozzle design for front-side edge bead removal in photolithography resist process | Quang N. Tran | 2002-09-24 |
| 6451512 | UV-enhanced silylation process to increase etch resistance of ultra thin resists | Bharath Rangarajan, Ramkumar Subramanian, Bhanwar Singh, Michael K. Templeton, Sanjay K. Yedur +1 more | 2002-09-17 |
| 6444381 | Electron beam flood exposure technique to reduce the carbon contamination | Bhanwar Singh, Ramkumar Subramanian, Michael K. Templeton, Bharath Rangarajan, Bryan K. Choo +1 more | 2002-09-03 |
| 6444373 | Modification of mask layout data to improve mask fidelity | Ramkumar Subramanian, Bhanwar Singh, Bharath Rangarajan | 2002-09-03 |
| 6441398 | Algorithm for detecting sloped contact holes using a critical-dimension waveform | Jean Y. Yang, Ian Dudley | 2002-08-27 |
| 6423479 | Cleaning carbon contamination on mask using gaseous phase | Ramkumar Subramanian, Bharath Rangarajan, Bhanwar Singh, Sanjay K. Yedur, Bryan K. Choo | 2002-07-23 |
| 6373053 | Analysis of CD-SEM signal to detect scummed/closed contact holes and lines | Bryan K. Choo, Bhanwar Singh, Sanjay K. Yedur | 2002-04-16 |
| 6371134 | Ozone cleaning of wafers | Ramkumar Subramanian, Bharath Rangarajan, Bhanwar Singh, Sanjay K. Yedur, Bryan K. Choo | 2002-04-16 |
| 6339955 | Thickness measurement using AFM for next generation lithography | Bharath Rangarajan, Bhanwar Singh | 2002-01-22 |