Issued Patents All Time
Showing 26–48 of 48 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8926850 | Plasma processing with enhanced charge neutralization and process control | Vikram Singh, Bernard G. Lindsay | 2015-01-06 |
| 8907307 | Apparatus and method for maskless patterned implantation | Christopher J. Leavitt, Ludovic Godet | 2014-12-09 |
| 8858816 | Enhanced etch and deposition profile control using plasma sheath engineering | Ludovic Godet, George D. Papasouliotis, Vikram Singh | 2014-10-14 |
| 8835879 | Reduction of deposition by separation of ion beam and neutral flow | Frank Sinclair, Greg Citver | 2014-09-16 |
| 8778603 | Method and system for modifying substrate relief features using ion implantation | Ludovic Godet, Patrick M. Martin, Vikram Singh | 2014-07-15 |
| 8716682 | Apparatus and method for multiple slot ion implantation | Anthony Renau, Ludovic Godet, Joseph C. Olson | 2014-05-06 |
| 8669538 | Method of improving ion beam quality in an implant system | Bon-Woong Koo, Christopher J. Leavitt, Peter F. Kurunczi, Svetlana B. Radovanov | 2014-03-11 |
| 8669540 | System and method for gas leak control in a substrate holder | Richard S. Muka, Julian G. Blake | 2014-03-11 |
| 8664098 | Plasma processing apparatus | Ludovic Godet, Svetlana B. Radovanov, Anthony Renau, Vikram Singh | 2014-03-04 |
| 8623171 | Plasma processing apparatus | Ludovic Godet, Christopher J. Leavitt, Bernard G. Lindsay | 2014-01-07 |
| 8603591 | Enhanced etch and deposition profile control using plasma sheath engineering | Ludovic Godet, George D. Papasouliotis, Vikram Singh | 2013-12-10 |
| 8461030 | Apparatus and method for controllably implanting workpieces | Anthony Renau, Ludovic Godet, Joseph C. Olson, Vikram Singh, James P. Buonodono +4 more | 2013-06-11 |
| 8460569 | Method and system for post-etch treatment of patterned substrate features | Ludovic Godet, Christopher R. Hatem, Patrick M. Martin | 2013-06-11 |
| 8461554 | Apparatus and method for charge neutralization during processing of a workpiece | Peter F. Kurunczi, Christopher J. Leavitt, Daniel Distaso | 2013-06-11 |
| 8288741 | Apparatus and method for three dimensional ion processing | Ludovic Godet | 2012-10-16 |
| 8188445 | Ion source | Ludovic Godet, Joseph C. Olson, Vikram Singh | 2012-05-29 |
| 8101510 | Plasma processing apparatus | Ludovic Godet, Svetlana B. Radovanov, Anthony Renau, Vikram Singh | 2012-01-24 |
| 7820533 | Multi-step plasma doping with improved dose control | Vikram Singh | 2010-10-26 |
| 7767977 | Ion source | Ludovic Godet, Svetlana B. Radovanov | 2010-08-03 |
| 7586100 | Closed loop control and process optimization in plasma doping processes using a time of flight ion detector | Deven M. Raj, Ludovic Godet, Bernard G. Lindsay, George D. Papasouliotis | 2009-09-08 |
| 7524743 | Conformal doping apparatus and method | Atul Gupta, Vikram Singh, Edmund J. Winder | 2009-04-28 |
| 7397048 | Technique for boron implantation | Vikram Singh, Edmund J. Winder, Harold Persing, Ziwei Fang, Atul Gupta | 2008-07-08 |
| 7132672 | Faraday dose and uniformity monitor for plasma based ion implantation | Steven R. Walther, Rajesh Dorai, Harold Persing, Jay T. Scheuer, Bon-Woong Koo +2 more | 2006-11-07 |