Issued Patents All Time
Showing 26–50 of 99 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10665433 | Extreme edge uniformity control | Alexandre Likhanskii, Maureen Petterson, Anthony Renau, Christopher A. Rowland, Costel Biloiu | 2020-05-26 |
| 10629437 | Techniques and structure for forming dynamic random-access device using angled ions | Sony Varghese, Steven R. Sherman, Rajesh Prasad, Min Gyu Sung | 2020-04-21 |
| 10600675 | Techniques and structure for forming thin silicon-on-insulator materials | Andrew Waite, Morgan Evans | 2020-03-24 |
| 10553448 | Techniques for processing a polycrystalline layer using an angled ion beam | Tristan Y. Ma, Morgan Evans, Kevin Anglin, Robert Masci | 2020-02-04 |
| 10545408 | Performance improvement of EUV photoresist by ion implantation | Tristan Y. Ma, Huixiong Dai, Anthony Renau, Joseph C. Olson | 2020-01-28 |
| 10546730 | Filling a cavity in a substrate using sputtering and deposition | Simon Ruffell | 2020-01-28 |
| 10403738 | Techniques for improved spacer in nanosheet device | Min Gyu Sung, Rajesh Prasad, Sony Varghese | 2019-09-03 |
| 10381232 | Techniques for manipulating patterned features using ions | Simon Ruffell, Huixiong Dai, Jun Lang | 2019-08-13 |
| 10310379 | Multiple patterning approach using ion implantation | Tristan Y. Ma, Maureen Petterson, Steven R. Sherman | 2019-06-04 |
| 10229832 | Techniques for forming patterned features using directional ions | Steven R. Sherman, Simon Ruffell | 2019-03-12 |
| 10204909 | Non-uniform gate oxide thickness for DRAM device | Simon Ruffell, Arvind Kumar, Tristan Y. Ma, Kyu-Ha Shim, Steven R. Sherman | 2019-02-12 |
| 10113229 | Techniques for controlling ion/neutral ratio of a plasma source | Tsung-Liang Chen, Shurong Liang, Joseph C. Olson | 2018-10-30 |
| 10109498 | Composite patterning mask using angled ion beam deposition | — | 2018-10-23 |
| 10008384 | Techniques to engineer nanoscale patterned features using ions | Simon Ruffell, Adam Brand, Huixiong Dai | 2018-06-26 |
| 10002764 | Sputter etch material selectivity | Kevin Anglin, Tristan Y. Ma, Morgan Evans, Heyun Yin | 2018-06-19 |
| 9997351 | Apparatus and techniques for filling a cavity using angled ion beam | Tsung-Liang Chen, Shurong Liang | 2018-06-12 |
| 9984889 | Techniques for manipulating patterned features using ions | Simon Ruffell, Huixiong Dai, Jun Lang | 2018-05-29 |
| 9934981 | Techniques for processing substrates using directional reactive ion etching | Steven R. Sherman, Simon Ruffell, Adam Brand | 2018-04-03 |
| 9929015 | High efficiency apparatus and method for depositing a layer on a three dimensional structure | Thomas R. Omstead, Simon Ruffell, Tristan Y. Ma, Ethan A. Wright | 2018-03-27 |
| 9885957 | Ion-assisted deposition and implantation of photoresist to improve line edge roughness | Maureen Petterson, Tristan Y. Ma | 2018-02-06 |
| 9735013 | Ion implantation for improved contact hole critical dimension uniformity | Tristan Y. Ma, Maureen Petterson, Boya Cui | 2017-08-15 |
| 9659784 | Ion-assisted deposition and implantation of photoresist to improve line edge roughness | Maureen Petterson, Tristan Y. Ma | 2017-05-23 |
| 9512517 | Multiple exposure treatment for processing a patterning feature | Tristan Y. Ma, Maureen Petterson, Ludovic Godet | 2016-12-06 |
| 9287123 | Techniques for forming angled structures for reduced defects in heteroepitaxy of semiconductor films | Swaminathan Srinivasan, Fareen Adeni Khaja, Simon Ruffell | 2016-03-15 |
| 9236257 | Techniques to mitigate straggle damage to sensitive structures | Christopher R. Hatem, Anthony Renau, Ludovic Godet | 2016-01-12 |