Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12387942 | Modifying patterned features using a directional etch | Tassie Andersen | 2025-08-12 |
| 11984318 | Directional modification of patterning structure to enhance pattern elongation process margin | Alexander C. Kontos, Il-Woong Koo | 2024-05-14 |
| 11854818 | Angled etch for surface smoothing | Tassie Andersen | 2023-12-26 |
| 11842923 | Methods for forming elongated contact hole ends | Glen F. R. Gilchrist | 2023-12-12 |
| 11380517 | System and method for spatially resolved optical metrology of an ion beam | Gang Shu, Glen Gilchrist | 2022-07-05 |
| 11335590 | Methods for forming elongated contact hole ends | Glen F. R. Gilchrist | 2022-05-17 |
| 10840132 | Methods for forming elongated contact hole ends | Glen F. R. Gilchrist | 2020-11-17 |
| 10730082 | Apparatus and method for differential in situ cleaning | Glen Gilchrist, Costel Biloiu, Christopher Campbell, Vikram Singh | 2020-08-04 |
| 10699871 | System and method for spatially resolved optical metrology of an ion beam | Gang Shu, Glen F. R. Gilchrist | 2020-06-30 |
| 10600616 | Apparatus and techniques to treat substrates using directional plasma and point of use chemistry | Costel Biloiu, Glen Gilchrist, Vikram Singh, Christopher Campbell, Richard J. Hertel +1 more | 2020-03-24 |
| 10535522 | Angular control of ion beam for vertical surface treatment | Gang Shu, Glen Gilchrist | 2020-01-14 |
| 10312432 | Magnetic memory device and techniques for forming | Tsung-Liang Chen, Alexander C. Kontos | 2019-06-04 |
| 10193066 | Apparatus and techniques for anisotropic substrate etching | Glen Gilchrist, Raees Pervaiz, Kenneth L. Starks, Tyler Rockwell | 2019-01-29 |
| 10141161 | Angle control for radicals and reactive neutral ion beams | Glen Gilchrist | 2018-11-27 |
| 10128082 | Apparatus and techniques to treat substrates using directional plasma and point of use chemistry | Costel Biloiu, Glen F. R. Gilchrist, Vikram Singh, Christopher Campbell, Richard J. Hertel +1 more | 2018-11-13 |
| 10113229 | Techniques for controlling ion/neutral ratio of a plasma source | Tsung-Liang Chen, John Hautala, Joseph C. Olson | 2018-10-30 |
| 10004133 | Apparatus and techniques to treat substrates using directional plasma and reactive gas | Costel Biloiu, Glen Gilchrist, Vikram Singh, Christopher Campbell, Richard J. Hertel +3 more | 2018-06-19 |
| 9997351 | Apparatus and techniques for filling a cavity using angled ion beam | Tsung-Liang Chen, John Hautala | 2018-06-12 |
| 9865433 | Gas injection system for ion beam device | Jay Wallace, Ernest E. Allen, Richard J. Hertel, Alexander C. Kontos, Jeffrey E. Krampert +1 more | 2018-01-09 |
| 9706634 | Apparatus and techniques to treat substrates using directional plasma and reactive gas | Costel Biloiu, Glen F. R. Gilchrist, Vikram Singh, Christopher Campbell, Richard J. Hertel +3 more | 2017-07-11 |
| 9299775 | Methods for the production of integrated circuits comprising epitaxially grown replacement structures | Steven Bentley, Kejia Wang, Sylvie Mignot | 2016-03-29 |
| 9275861 | Methods of forming group III-V semiconductor materials on group IV substrates and the resulting substrate structures | Li Yang, Kejia Wang, Ashish Baraskar, Bin Yang | 2016-03-01 |
| 9224605 | Forming alternative material fins with reduced defect density by performing an implantation/anneal defect generation process | Yi Qi, Ajey Poovannummoottil Jacob | 2015-12-29 |
| 9123627 | Methods of forming alternative material fins with reduced defect density for a FinFET semiconductor device | Yi Qi, Ajey Poovannummoottil Jacob | 2015-09-01 |