Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11984318 | Directional modification of patterning structure to enhance pattern elongation process margin | Shurong Liang, Alexander C. Kontos | 2024-05-14 |
| 11545368 | Phosphorus fugitive emission control | Cuiyang Wang, Timothy J. Miller, Jun Seok Lee, Deven Raj Mittal, Peter G. Ryan, Jr. | 2023-01-03 |
| 11127601 | Phosphorus fugitive emission control | Cuiyang Wang, Timothy J. Miller, Jun Seok Lee, Deven Raj Mittal, Peter G. Ryan, Jr. | 2021-09-21 |
| 10988843 | System for determining cleaning process endpoint | Cuiyang Wang, Peter G. Ryan, Jr., Jun Seok Lee | 2021-04-27 |