Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12387914 | Upper electrode assembly | Lifu LI, Takaki Kobune | 2025-08-12 |
| 12354841 | Substrate processing device, substrate processing system, control method for substrate processing device, and control method for substrate processing system | Ikko Tanaka | 2025-07-08 |
| 12217942 | Plasma processing apparatus | Lifu LI, Hironobu Kudo | 2025-02-04 |
| 11676800 | Substrate processing apparatus and control method of substrate processing apparatus | Ikko Tanaka, Lifu LI, Atsushi TERASAWA | 2023-06-13 |
| 11557498 | Substrate processing method and substrate processing apparatus | Toru Takahashi, Nobuaki Shindo, Shigeru Yoneda | 2023-01-17 |
| 10867778 | Cleaning method and processing apparatus | Toshikatsu TOBANA | 2020-12-15 |
| 10861675 | Plasma processing apparatus and plasma processing method | Takao FUNAKUBO, Hirofumi Haga, Shinichi Kozuka, Wataru Ozawa, Akihiro Sakamoto +2 more | 2020-12-08 |
| 10480978 | Method for inspecting flow rate controller and method for processing workpiece | Kumiko Ono | 2019-11-19 |
| 10410840 | Gas supplying method and semiconductor manufacturing apparatus | Tomoyuki Mizutani | 2019-09-10 |
| 10269539 | Plasma processing method | Kumiko Ono, Koichi Nagami | 2019-04-23 |
| 10204763 | Plasma processing apparatus and plasma processing method | Takao FUNAKUBO, Hirofumi Haga, Shinichi Kozuka, Wataru Ozawa, Akihiro Sakamoto +2 more | 2019-02-12 |
| 10163607 | Temperature control method and plasma processing apparatus | Keigo Toyoda | 2018-12-25 |
| 9960016 | Plasma processing method | Kumiko Ono, Koichi Nagami | 2018-05-01 |
| 9947510 | Method for supplying gas, and plasma processing apparatus | Tomoyuki Mizutani | 2018-04-17 |
| 9904299 | Gas supply control method | Kumiko Ono, Atsushi Sawachi, Norihiko Amikura, Norikazu Sasaki, Yoshitaka Kawaguchi | 2018-02-27 |
| 9818582 | Plasma processing method | Hiraku MURAKAMI, Nobutaka SASAKI, Shigeru Senzaki, Takanori BANSE, Keigo Toyoda | 2017-11-14 |
| 9728418 | Etching method and etching apparatus | Keigo Toyoda, Masaru ISAGO | 2017-08-08 |
| 9583315 | Plasma etching apparatus and plasma etching method | Tomoyuki Mizutani | 2017-02-28 |
| 9524847 | Substrate processing apparatus | Nobuhiro Wada, Makoto Kobayashi, Jun Tamura, Mamoru NAOI, Jun Oyabu | 2016-12-20 |
| 9455125 | Substrate processing apparatus | Akihiro Yoshimura, Tetsuji Sato, Masato Horiguchi, Nobuhiro Wada, Makoto Kobayashi +2 more | 2016-09-27 |
| 8858754 | Plasma processing apparatus | Masato Horiguchi, Takashi Kitazawa | 2014-10-14 |
| 8592319 | Substrate processing method and substrate processing apparatus | Nobuhiro Wada, Makoto Kobayashi, Jun Tamura, Mamoru NAOI, Jun Oyabu | 2013-11-26 |
| 8383000 | Substrate processing apparatus, method for measuring distance between electrodes, and storage medium storing program | Makoto Kobayashi, Jun Tamura, Nobuhiro Wada | 2013-02-26 |
| 8328981 | Method for heating a focus ring in a plasma apparatus by high frequency power while no plasma being generated | — | 2012-12-11 |
| 8277673 | Plasma processing method and apparatus | Toshifumi Nagaiwa, Yuji Otsuka | 2012-10-02 |