Issued Patents All Time
Showing 26–50 of 94 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9679100 | Environmental-surrounding-aware OPC | Wen-Li Cheng, Ming-Hui Chih, Ru-Gun Liu | 2017-06-13 |
| 9627262 | Method of patterning features of a semiconductor device | Wei-Chao Chiu, Chen Chen, Chih-Ming Lai, Ming-Feng Shieh, Nian-Fuh Cheng +1 more | 2017-04-18 |
| 9529959 | System and method for pattern correction in e-beam lithography | Hung-Chun Wang, Hsu-Ting Huang, Ru-Gun Liu | 2016-12-27 |
| 9514266 | Method and system of determining colorability of a layout | Nien-Yu Tsai, Chin-Chang Hsu, Wen-Ju Yang | 2016-12-06 |
| 9418191 | Providing electron beam proximity effect correction by simulating write operations of polygonal shapes | Hung-Chun Wang, Jeng-Horng Chen, Shy-Jay Lin, Chia-Ping Chiang, Cheng Kun Tsai +1 more | 2016-08-16 |
| 9411924 | Methodology for pattern density optimization | Hung-Chun Wang, Ming-Hui Chih, Ping-Chieh Wu, Chun-Hung Wu, Wen-Hao Liu +3 more | 2016-08-09 |
| 9395618 | Enhanced EUV lithography system | Ching-Hsu Chang, Nian-Fuh Cheng, Chih-Shiang Chou, Ru-Gun Liu | 2016-07-19 |
| 9390223 | Method of determining whether a layout is colorable | Wen-Li Cheng, Ming-Hui Chih, Chia-Ping Chiang, Ken-Hsien Hsieh, Tsong-Hua Ou +1 more | 2016-07-12 |
| 9390217 | Methodology of optical proximity correction optimization | Hung-Chun Wang, Ming-Hui Chih, Yu-Po Tang, Chia-Ping Chiang, Feng-Ju Chang +2 more | 2016-07-12 |
| 9362119 | Methods for integrated circuit design and fabrication | Tsong-Hua Ou, Ken-Hsien Hsieh, Shih-Ming Chang, Chih-Ming Lai, Ru-Gun Liu +1 more | 2016-06-07 |
| 9336986 | Electron beam data storage system and method for high volume manufacturing | Hung-Chun Wang, Pei-Shiang Chen, Tzu-Chin Lin, Faruk Krecinic, Jeng-Horng Chen +1 more | 2016-05-10 |
| 9298083 | Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof | Ching-Hsu Chang, Hung-Chun Wang, Boren Luo, Ru-Gun Liu | 2016-03-29 |
| 9280041 | Cross quadrupole double lithography method using two complementary apertures | Hsien-Cheng Wang, Hung-Chang Hsieh, Shih-Che Wang, Ping-Chieh Wu, Ming-Chang Wen | 2016-03-08 |
| 9262578 | Method for integrated circuit manufacturing | Hung-Chun Wang, Ching-Hsu Chang, Feng-Ju Chang, Chun-Hung Wu, Ping-Chieh Wu +5 more | 2016-02-16 |
| 9209048 | Two step molding grinding for packaging applications | Chien-Chen Li, Kuo-Chio Liu, Ruey-Yun Shiue, Hsi-Kuei Cheng, Chih-Hsien Lin +3 more | 2015-12-08 |
| 9189588 | Polygon-based optical proximity correction | Wen-Li Cheng, Ming-Hui Chih, Yu-Po Tang, Chia-Ping Chiang, Cheng-Lung Tsai +3 more | 2015-11-17 |
| 9176373 | System and method for decomposition of a single photoresist mask pattern into 3 photoresist mask patterns | Wen-Li Cheng, Ming-Hui Chih, Chia-Ping Chiang, Ken-Hsien Hsieh, Tsong-Hua Ou +1 more | 2015-11-03 |
| 9165095 | Target point generation for optical proximity correction | Ming-Hui Chih, Wen-Li Cheng, Yu-Po Tang, Ping-Chieh Wu, Chia-Ping Chiang +2 more | 2015-10-20 |
| 9165106 | Layout design for electron-beam high volume manufacturing | Hung-Chun Wang, Shao-Yun Fang, Tzu-Chin Lin, Ru-Gun Liu | 2015-10-20 |
| 9091930 | Enhanced EUV lithography system | Ching-Hsu Chang, Nian-Fuh Cheng, Chih-Shiang Chou, Ru-Gun Liu | 2015-07-28 |
| 9023695 | Method of patterning features of a semiconductor device | Wei-Chao Chiu, Nian-Fuh Cheng, Chen Chen, Ming-Feng Shieh, Chih-Ming Lai +1 more | 2015-05-05 |
| 9026955 | Methodology for pattern correction | Hung-Chun Wang, Ming-Hui Chih, Ping-Chieh Wu, Chun-Hung Wu, Feng-Ju Chang +2 more | 2015-05-05 |
| 9026957 | Method of defining an intensity selective exposure photomask | Chia-Chu Liu, Kuei-Shun Chen, Chih-Yang Yeh, Te-Chih Huang, Wen-Hao Liu +9 more | 2015-05-05 |
| 9003336 | Mask assignment optimization | Ken-Hsien Hsieh, Ming-Hui Chih, Chih-Ming Lai, Ru-Gun Liu, Ko-Bin Kao +4 more | 2015-04-07 |
| 8959460 | Layout decomposition method | Ming-Hui Chih, Chia-Ping Chiang, Ru-Gun Liu, Tsai-Sheng Gau, Jia-Guei Jou +3 more | 2015-02-17 |