Issued Patents All Time
Showing 51–75 of 94 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8954899 | Contour alignment system | Ping-Chieh Wu, Tzu-Chin Lin, Hung-Ting Lu, Ru-Gun Liu | 2015-02-10 |
| 8949749 | Layout design for electron-beam high volume manufacturing | Hung-Chun Wang, Shao-Yun Fang, Tzu-Chin Lin, Ru-Gun Liu | 2015-02-03 |
| 8949758 | Hybrid design rule for double patterning | Cheng-I Huang, Wen-Hao Chen | 2015-02-03 |
| 8943445 | Method of merging color sets of layout | Pi-Tsung Chen, Ming-Hui Chih, Ken-Hsien Hsieh, Wei-Long Wang, Ru-Gun Liu +4 more | 2015-01-27 |
| 8850367 | Method of decomposable checking approach for mask alignment in multiple patterning | Chih-Ming Lai, Ken-Hsien Hsieh, Ru-Gun Liu | 2014-09-30 |
| 8841049 | Electron beam data storage system and method for high volume manufacturing | Hung-Chun Wang, Pei-Shiang Chen, Tzu-Chin Lin, Faruk Krecinic, Jeng-Horng Chen +1 more | 2014-09-23 |
| 8806386 | Customized patterning modulation and optimization | Ying-Chou Cheng, Ru-Gun Liu, Josh J. H. Feng, Tsong-Hua Ou, Luke Lo +1 more | 2014-08-12 |
| 8764995 | Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof | Ching-Hsu Chang, Hung-Chun Wang, Boren Luo, Ru-Gun Liu | 2014-07-01 |
| 8762899 | Method for metal correlated via split for double patterning | Burn Jeng Lin, Tsai-Sheng Gau, Ru-Gun Liu | 2014-06-24 |
| 8751976 | Pattern recognition for integrated circuit design | Cheng-Lung Tsai, Jui-Hsuan Feng, Sheng-Wen Lin, Wen-Li Cheng, Ru-Gun Liu | 2014-06-10 |
| 8745554 | Practical approach to layout migration | Ying-Chou Cheng, Tsong-Hua Ou, Josh J. H. Feng, Cheng-Lung Tsai, Ru-Gun Liu | 2014-06-03 |
| 8745550 | Fracture aware OPC | Nian-Fuh Cheng, Yu-Po Tang, Chien-Fu Lee, Sheng-Wen Lin, Yong-Cheng Lin +1 more | 2014-06-03 |
| 8739080 | Mask error enhancement factor (MEEF) aware mask rule check (MRC) | Cheng-Lung Tsai, Jui-Hsuan Feng, Sheng-Wen Lin, Ru-Gun Liu | 2014-05-27 |
| 8681326 | Method and apparatus for monitoring mask process impact on lithography performance | Ping-Chieh Wu, Chien-Hsun Chen, Ru-Gun Liu, Chih-Ming Lai, Boren Luo | 2014-03-25 |
| 8683392 | Double patterning methodology | Ken-Hsien Hsieh, Huang-Yu Chen, Jhih-Jian Wang, Cheng Kun Tsai, Tsong-Hua Ou +1 more | 2014-03-25 |
| 8673520 | Intensity selective exposure photomask | George Liu, Kuei-Shun Chen, Chih-Yang Yeh, Te-Chih Huang, Wen-Hao Liu +9 more | 2014-03-18 |
| 8656319 | Optical proximity correction convergence control | Cheng-Cheng Kuo, Ching-Che Tsai, Tzu-Chun Lo, Chih-Wei Hsu, Hua-Tai Lin +4 more | 2014-02-18 |
| 8631360 | Methodology of optical proximity correction optimization | Hung-Chun Wang, Ming-Hui Chih, Yu-Po Tang, Chia-Ping Chiang, Feng-Ju Chang +2 more | 2014-01-14 |
| 8631379 | Decomposing integrated circuit layout | Pi-Tsung Chen, Ming-Hui Chih, Ken-Hsien Hsieh, Wei-Long Wang, Ru-Gun Liu +4 more | 2014-01-14 |
| 8627241 | Pattern correction with location effect | Hung-Chun Wang, Ming-Hui Chih, Cheng Kun Tsai, Ru-Gun Liu | 2014-01-07 |
| 8601407 | Geometric pattern data quality verification for maskless lithography | Hung-Chun Wang, Pei-Shiang Chen, Tzu-Chin Lin, Cheng-Hung Chen, Shih-Chi Wang +3 more | 2013-12-03 |
| 8572519 | Method and apparatus for reducing implant topography reflection effect | Wen-Hao Liu, Hsien-Huang Liao, Chi-Cheng Hung, Ru-Gun Liu | 2013-10-29 |
| 8527916 | Dissection splitting with optical proximity correction to reduce corner rounding | Chia-Ping Chiang, Tsong-Hua Ou, Yu-Po Tang, Ming-Hui Chih, Wen-Li Cheng +2 more | 2013-09-03 |
| 8527918 | Target-based thermal design using dummy insertion for semiconductor devices | Ying-Chou Cheng, Boren Luo, Wen-Hao Liu, Tsong-Hua Ou, Chih-Wei Hsu +1 more | 2013-09-03 |
| 8507159 | Electron beam data storage system and method for high volume manufacturing | Hung-Chun Wang, Pei-Shiang Chen, Tzu-Chin Lin, Faruk Krecinic, Jeng-Horng Chen +1 more | 2013-08-13 |