Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12293940 | Techniques for forming a deep trench isolation structure between photodiodes by forming a first set of trenches based on a first pattern and forming a second set of trenches based on a second pattern | Yu-Wen Chen, Yong-Jin LIOU, Chun-Wei Chang, Ching-Sen Kuo, Feng-Jia Shiu | 2025-05-06 |
| 12100592 | Implantation mask formation | Yong-Jin LIOU, Yu-Wen Chen, Chun-Wei Chang, Ching-Sen Kuo, Feng-Jia Shiu | 2024-09-24 |
| 11996432 | Image sensor device and manufacturing method thereof | Chun-Wei Chang, Ching-Sen Kuo, Feng-Jia Shiu | 2024-05-28 |
| 11911377 | Method for treating hypertension by using compound | Fu-Tien Chiang | 2024-02-27 |
| 11658031 | Implantation mask formation | Yong-Jin LIOU, Yu-Wen Chen, Chun-Wei Chang, Ching-Sen Kuo, Feng-Jia Shiu | 2023-05-23 |
| 11411033 | Image sensor device and manufacturing method thereof | Chun-Wei Chang, Ching-Sen Kuo, Feng-Jia Shiu | 2022-08-09 |
| 11086221 | Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces | Chih-Chien Wang, Feng-Jia Shiu, Ching-Sen Kuo, Chun-Wei Chang, Kai-Meng Tzeng | 2021-08-10 |
| 10734436 | Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces | Chih-Chien Wang, Feng-Jia Shiu, Ching-Sen Kuo, Chun-Wei Chang, Kai-Meng Tzeng | 2020-08-04 |
| 10546889 | Method of high-aspect ratio pattern formation with submicron pixel pitch | Chih-Chien Wang, Feng-Jia Shiu, Ching-Sen Kuo, Chun-Wei Chang, Kai-Meng Tzeng | 2020-01-28 |
| 10186542 | Patterning for substrate fabrication | Kai-Meng Tzeng, Chih-Chien Wang, Chun-Wei Chang, Ching-Sen Kuo, Feng-Jia Shiu +1 more | 2019-01-22 |
| 10121811 | Method of high-aspect ratio pattern formation with submicron pixel pitch | Chih-Chien Wang, Feng-Jia Shiu, Ching-Sen Kuo, Chun-Wei Chang, Kai-Meng Tzeng | 2018-11-06 |
| 10090357 | Method of using a surfactant-containing shrinkage material to prevent photoresist pattern collapse caused by capillary forces | Chih-Chien Wang, Feng-Jia Shiu, Ching-Sen Kuo, Chun-Wei Chang, Kai-Meng Tzeng | 2018-10-02 |
| 9627262 | Method of patterning features of a semiconductor device | Chen Chen, Chih-Ming Lai, Ming-Feng Shieh, Nian-Fuh Cheng, Ru-Gun Liu +1 more | 2017-04-18 |
| 9023695 | Method of patterning features of a semiconductor device | Nian-Fuh Cheng, Chen Chen, Ming-Feng Shieh, Chih-Ming Lai, Wen-Chun Huang +1 more | 2015-05-05 |