Issued Patents All Time
Showing 76–100 of 188 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8541158 | Positive resist compositions and patterning process | Wataru Kusaki, Takeshi Kinsho | 2013-09-24 |
| 8501384 | Positive resist composition and patterning process | Jun Hatakeyama, Seiichiro Tachibana | 2013-08-06 |
| 8431323 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | Satoshi Shinachi, Takeshi Kinsho, Koji Hasegawa, Yuji Harada, Jun Hatakeyama +2 more | 2013-04-30 |
| 8426110 | Chemically amplified positive resist composition, patterning process, and acid-decomposable keto ester compound | Tomohiro Kobayashi, Katsuya Takemura, Jun Hatakeyama | 2013-04-23 |
| 8426105 | Resist-modifying composition and pattern forming process | Masashi Iio, Kazuhiro Katayama, Jun Hatakeyama, Tsunehiro Nishi, Takeshi Kinsho | 2013-04-23 |
| 8420292 | Polymer, resist composition, and patterning process | Yuji Harada, Takeshi Sasami, Yuuki Suka, Koji Hasegawa | 2013-04-16 |
| 8367310 | Pattern forming process and resist-modifying composition | Masashi Iio, Jun Hatakeyama, Tsunehiro Nishi, Yoshio Kawai | 2013-02-05 |
| 8349533 | Resist lower-layer composition containing thermal acid generator, resist lower layer film-formed substrate, and patterning process | Youichi Ohsawa, Jun Hatakeyama, Takeshi Kinsho | 2013-01-08 |
| 8338078 | Photoresist undercoat-forming material and patterning process | Jun Hatakeyama, Toshihiko Fujii, Youichi Ohsawa | 2012-12-25 |
| 8329384 | Resist-modifying composition and pattern forming process | Kazuhiro Katayama, Masashi Iio, Jun Hatakeyama, Tsunehiro Nishi, Takeshi Kinsho | 2012-12-11 |
| 8323872 | Resist protective coating material and patterning process | Jun Hatakeyama, Yuji Harada | 2012-12-04 |
| 8313890 | Antireflective coating composition, antireflective coating, and patterning process | Seiichiro Tachibana, Kazumi Noda, Jun Hatakeyama, Takeshi Kinsho | 2012-11-20 |
| 8273830 | Deprotection method of protected polymer | Keiichi Masunaga, Daisuke Domon, Satoshi Watanabe | 2012-09-25 |
| 8216766 | Polymer, polymer preparation method, resist composition and patterning process | Takeshi Kinsho, Tomohiro Kobayashi, Tadahiro Sunaga, Yuichi Okawa, Hirofumi Io | 2012-07-10 |
| 8168367 | Resist composition and patterning process | Satoshi Watanabe, Akinobu Tanaka, Takeshi Kinsho | 2012-05-01 |
| 8129086 | Polymerizable compound, polymer, positive resist composition, and patterning process using the same | Jun Hatakeyama, Seiichiro Tachibana | 2012-03-06 |
| 8114571 | Photoacid generator, resist composition, and patterning process | Masaki Ohashi, Youichi Ohsawa, Takeshi Kinsho | 2012-02-14 |
| 8114570 | Photoacid generator, resist composition, and patterning process | Youichi Ohsawa, Takeshi Kinsho, Koji Hasegawa, Masaki Ohashi | 2012-02-14 |
| 8105760 | Patterning process and pattern surface coating composition | Jun Hatakeyama, Katsuhiro Kobayashi, Kazuhiro Katayama | 2012-01-31 |
| 8062828 | Positive resist composition and patterning process | Youichi Ohsawa, Takeshi Kinsho, Masaki Ohashi, Seiichiro Tachibana, Jun Hatakeyama | 2011-11-22 |
| 8062831 | Carboxyl-containing lactone compound, polymer, resist composition, and patterning process | Satoshi Shinachi, Tsunehiro Nishi, Koji Hasegawa, Takeshi Kinsho, Seiichiro Tachibana | 2011-11-22 |
| 8053165 | Hydroxyl-containing monomer, polymer, resist composition, and patterning process | Takeshi Kinsho, Masaki Ohashi, Koji Hasegawa | 2011-11-08 |
| 8030515 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Katsuhiro Kobayashi, Youichi Ohsawa, Takeshi Kinsho | 2011-10-04 |
| 8021822 | Positive resist compositions and patterning process | Youichi Ohsawa, Takeshi Kinsho | 2011-09-20 |
| 8017302 | Positive resist compositions and patterning process | Youichi Ohsawa, Takeshi Kinsho | 2011-09-13 |