Issued Patents All Time
Showing 126–150 of 188 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7511169 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Youichi Ohsawa, Takeshi Kinsho, Katsuhiro Kobayashi | 2009-03-31 |
| 7485408 | Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process | Takeshi Kinsho, Mutsuo Nakashima, Koji Hasegawa | 2009-02-03 |
| 7468236 | Amine compound, chemically amplified resist composition and patterning process | Jun Hatakeyama | 2008-12-23 |
| 7378548 | Tertiary amine compounds having an ester structure and processes for preparing the same | Koji Hasegawa, Takeshi Kinsho, Jun Hatakeyama | 2008-05-27 |
| 7312288 | Polymerizable fluorinated ester compounds and their preparing processes | Takeshi Kinsho | 2007-12-25 |
| 7285368 | Polymerizable ester having sulfonamide structure, polymer, resist composition and patterning process | Takeshi Kinsho | 2007-10-23 |
| 7276324 | Nitrogen-containing organic compound, resist composition and patterning process | Takeshi Kinsho, Koji Hasegawa, Katsuya Takemura, Kazumi Noda, Katsuhiro Kobayashi | 2007-10-02 |
| 7261995 | Nitrogen-containing organic compound, chemically amplified resist composition and patterning process | Koji Hasegawa, Katsuya Takemura, Kazumi Noda | 2007-08-28 |
| 7252925 | Nitrogen-containing organic compound, resist composition and patterning process | Takeshi Kinsho, Katsuya Takemura, Akihiro Seki | 2007-08-07 |
| 7202318 | Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process | Takeshi Kinsho, Seiichiro Tachibana, Jun Hatakeyama | 2007-04-10 |
| 7192684 | Polymerizable silicon-containing compound, manufacturing method, polymer, resist composition and patterning process | Takeshi Kinsho, Koji Hasegawa | 2007-03-20 |
| 7179581 | Resist composition and patterning process | Jun Hatakeyama | 2007-02-20 |
| 7141351 | Basic compound, resist composition and patterning process | Takeshi Kinsho, Koji Hasegawa | 2006-11-28 |
| 7141352 | Basic compound, resist composition and patterning process | Takeshi Kinsho, Koji Hasegawa | 2006-11-28 |
| 7135270 | Resist polymer, resist composition and patterning process | Tsunehiro Nishi, Junji Tsuchiya, Kenji Funatsu, Koji Hasegawa | 2006-11-14 |
| 7132215 | Ester compounds, polymers, resist compositions and patterning process | Koji Hasegawa, Takeshi Kinsho | 2006-11-07 |
| 7084303 | Tertiary amine compounds having an ester structure and processes for preparing same | Koji Hasegawa, Takeshi Kinsho, Jun Hatakeyama | 2006-08-01 |
| 7041846 | Alicyclic methacrylate having oxygen substituent group on α-methyl | Jun Hatakeyama, Takeshi Kinsho | 2006-05-09 |
| 7037995 | Tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process | Takeshi Kinsho, Koji Hasegawa | 2006-05-02 |
| 7029822 | Tertiary alcohol compounds having alicyclic structure | Koji Hasegawa, Takeshi Kinsho | 2006-04-18 |
| 7012161 | Compound, fluorine-containing polymerizable cyclic olefin compound | Takeshi Kinsho, Yuji Harada | 2006-03-14 |
| 6962767 | Acetal compound, polymer, resist composition and patterning process | Takeshi Kinsho, Koji Hasegawa, Tsunehiro Nishi, Mutsuo Nakashima, Seiichiro Tachibana +1 more | 2005-11-08 |
| 6916593 | Resist composition | Jun Hatakeyama, Youichi Ohsawa | 2005-07-12 |
| 6899990 | Epoxy compound having alicyclic structure, polymer, resist composition and patterning process | Koji Hasegawa, Takeshi Kinsho, Tsunehiro Nishi | 2005-05-31 |
| 6794111 | Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation | Tsunehiro Nishi, Takeshi Kinsho, Seiichiro Tachibana, Koji Hasegawa, Tomohiro Kobayashi | 2004-09-21 |