Issued Patents All Time
Showing 101–125 of 188 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7998657 | Ester compounds and their preparation, polymers, resist compositions and patterning process | Masaki Ohashi, Takeshi Kinsho | 2011-08-16 |
| 7993811 | Positive resist compositions and patterning process | Youichi Ohsawa, Takeshi Kinsho | 2011-08-09 |
| 7981589 | Fluorinated monomer, fluorinated polymer, resist composition and patterning process | Koji Hasegawa, Takeshi Kinsho, Katsuhiro Kobayashi, Tsunehiro Nishi | 2011-07-19 |
| 7928262 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Katsuhiro Kobayashi, Youichi Ohsawa, Takeshi Kinsho | 2011-04-19 |
| 7919226 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Youichi Ohsawa, Takeshi Kinsho, Katsuhiro Kobayashi | 2011-04-05 |
| 7902385 | Ester compounds and their preparation, polymers, resist compositions and patterning process | Masaki Ohashi, Takeshi Kinsho | 2011-03-08 |
| 7868199 | Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process | Koji Hasegawa, Takeshi Kinsho, Tsunehiro Nishi, Masaki Ohashi | 2011-01-11 |
| 7807331 | Hydrogenated ring-opening metathesis polymer, resist composition and patterning process | Tomohiro Kobayashi, Takeshi Kinsho, Tadahiro Sunaga, Yuichi Okawa | 2010-10-05 |
| 7759047 | Resist protective film composition and patterning process | Jun Hatakeyama, Yuji Harada | 2010-07-20 |
| 7687222 | Polymerizable ester compounds, polymers, resist compositions and patterning process | Takeshi Kinsho, Koji Hasegawa, Seiichiro Tachibana, Masaki Ohashi | 2010-03-30 |
| 7670751 | Photoacid generator, resist composition, and patterning process | Masaki Ohashi, Youichi Ohsawa, Takeshi Kinsho | 2010-03-02 |
| 7666571 | Polymer, resist composition and patterning process | Seiichiro Tachibana, Takao Yoshihara | 2010-02-23 |
| 7638256 | Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process | Takeshi Kinsho, Mutsuo Nakashima, Yoshitaka Hamada | 2009-12-29 |
| 7632624 | Photoresist undercoat-forming material and patterning process | Jun Hatakeyama, Toshihiko Fujii, Katshiro Kobayashi | 2009-12-15 |
| 7629108 | Nitrogen-containing organic compound, resist composition and patterning process | Youichi Ohsawa, Masaki Ohashi, Wataru Kusaki, Tomohiro Kobayashi | 2009-12-08 |
| 7622242 | Resist composition and patterning process | Jun Hatakeyama, Koji Hasegawa, Yuji Harada | 2009-11-24 |
| 7598015 | Polymer, resist composition and patterning process | Seiichiro Tachibana, Tsunehiro Nishi | 2009-10-06 |
| 7592407 | Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process | Yuji Harada, Jun Hatakeyama, Takeshi Kinsho | 2009-09-22 |
| 7569324 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Katsuhiro Kobayashi, Youichi Ohsawa, Takeshi Kinsho | 2009-08-04 |
| 7569326 | Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process | Youichi Ohsawa, Masaki Ohashi, Seiichiro Tachibana, Jun Hatakeyama | 2009-08-04 |
| 7556909 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Katsuhiro Kobayashi, Youichi Ohsawa, Takeshi Kinsho, Masaki Ohashi | 2009-07-07 |
| 7531289 | Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process | Takeshi Kinsho, Masaki Ohashi, Koji Hasegawa, Seiichiro Tachibana | 2009-05-12 |
| 7531290 | Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Katsuhiro Kobayashi, Youichi Ohsawa, Takeshi Kinsho | 2009-05-12 |
| 7527912 | Photoacid generators, resist compositions, and patterning process | Youichi Ohsawa, Koji Hasegawa, Masaki Ohashi | 2009-05-05 |
| 7514202 | Thermal acid generator, resist undercoat material and patterning process | Youichi Ohsawa, Jun Hatakeyama | 2009-04-07 |