Issued Patents All Time
Showing 51–75 of 188 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9045587 | Naphthalene derivative, resist bottom layer material, and patterning process | Takeshi Kinsho, Daisuke KORI, Katsuya Takemura, Tsutomu Ogihara | 2015-06-02 |
| 9034661 | Method for producing molecule immobilizing substrate, and molecule immobilizing substrate | Wataru Kusaki, Toshinobu Ishihara, Takeshi Kinsho | 2015-05-19 |
| 9029064 | Patterning process and resist composition | Jun Hatakeyama, Masayoshi Sagehashi, Kazuhiro Katayama | 2015-05-12 |
| 8933251 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | Satoshi Shinachi, Takeshi Kinsho, Koji Hasegawa, Yuji Harada, Jun Hatakeyama +2 more | 2015-01-13 |
| 8921026 | Basic compound, chemically amplified resist composition, and patterning process | Jun Hatakeyama, Masayoshi Sagehashi | 2014-12-30 |
| 8877422 | Resist underlayer film composition and patterning process using the same | Tsutomu Ogihara, Daisuke KORI, Yusuke Biyajima, Toshihiko Fujii, Takeshi Kinsho | 2014-11-04 |
| 8853031 | Resist underlayer film composition and patterning process using the same | Tsutomu Ogihara, Daisuke KORI, Yusuke Biyajima, Toshihiko Fujii, Takeshi Kinsho | 2014-10-07 |
| 8846846 | Naphthalene derivative, resist bottom layer material, and patterning process | Takeshi Kinsho, Daisuke KORI, Katsuya Takemura, Tsutomu Ogihara | 2014-09-30 |
| 8835697 | Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning process | Daisuke KORI, Takeshi Kinsho, Katsuya Takemura, Tsutomu Ogihara, Hiroyuki Urano | 2014-09-16 |
| 8835094 | Fluoroalcohol, fluorinated monomer, polymer, resist composition and patterning process | Koji Hasegawa, Tomohiro Kobayashi, Takeshi Kinsho | 2014-09-16 |
| 8835092 | Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative | Takeshi Kinsho, Tsutomu Ogihara, Katsuya Takemura, Toshihiko Fujii, Daisuke KORI | 2014-09-16 |
| 8828641 | Chemically amplified resist composition and patterning process | Jun Hatakeyama | 2014-09-09 |
| 8808964 | Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning process | Masayoshi Sagehashi, Tomohiro Kobayashi | 2014-08-19 |
| 8795955 | Naphthalene derivative, resist bottom layer material, resist bottom layer forming method, and patterning process | Takeshi Kinsho, Katsuya Takemura, Daisuke KORI, Tsutomu Ogihara | 2014-08-05 |
| 8791288 | Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process | Takeshi Kinsho, Tomohiro Kobayashi, Masayoshi Sagehashi, Koji Hasegawa, Seiichiro Tachibana | 2014-07-29 |
| 8686166 | Preparation of 2,2-bis (fluoroalkyl) oxirane and preparation of photoacid generator therefrom | Masayoshi Sagehashi, Youichi Ohsawa, Koji Hasegawa, Masaki Ohashi | 2014-04-01 |
| 8685629 | Resist pattern forming process | Keiichi Masunaga, Satoshi Watanabe, Daisuke Domon | 2014-04-01 |
| 8663898 | Resist underlayer film composition and patterning process using the same | Tsutomu Ogihara, Yusuke Biyajima, Daisuke KORI, Takeshi Kinsho, Toshihiko Fujii | 2014-03-04 |
| 8658346 | Pattern forming process, chemically amplified positive resist composition, and resist-modifying composition | Tsunehiro Nishi, Masashi Iio | 2014-02-25 |
| 8628908 | Chemically amplified resist composition and patterning process | Tomohiro Kobayashi, Masayoshi Sagehashi, Takeshi Nagata, Youichi Ohsawa, Ryosuke Taniguchi | 2014-01-14 |
| 8609889 | Photoacid generator, resist composition, and patterning process | Masaki Ohashi, Youichi Ohsawa, Takeshi Kinsho | 2013-12-17 |
| 8603732 | Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process | Tsutomu Ogihara, Takeshi Kinsho, Katsuya Takemura, Toshihiko Fujii, Daisuke KORI | 2013-12-10 |
| 8592133 | Resist composition and patterning process | Satoshi Watanabe, Akinobu Tanaka, Takeshi Kinsho | 2013-11-26 |
| 8592956 | Resist underlayer film composition and patterning process using the same | Tsutomu Ogihara, Daisuke KORI, Yusuke Biyajima, Toshihiko Fujii, Takeshi Kinsho | 2013-11-26 |
| 8586282 | Resist composition and patterning process | Satoshi Watanabe, Akinobu Tanaka, Takeshi Kinsho | 2013-11-19 |