Issued Patents All Time
Showing 26–50 of 188 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10550136 | Method for producing polyalkylene glycol derivative having amino group at end | Yuki Suka, Yuji Harada, Shiori Nonaka | 2020-02-04 |
| 10472377 | Method for producing polyalkylene glycol derivative having amino group at end, polymerization initiator for use in the same, and alcohol compound as raw material for the polymerization initiator | Yuki Suka, Yuji Harada, Shiori Nonaka | 2019-11-12 |
| 10444628 | Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process | Daisuke KORI, Tsutomu Ogihara, Yoshinori Taneda, Kazunori Maeda | 2019-10-15 |
| 10429739 | Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process | Daisuke KORI, Tsutomu Ogihara, Yoshinori Taneda, Rie Kikuchi | 2019-10-01 |
| 10416563 | Resist underlayer film composition, patterning process, and method for forming resist underlayer film | Hironori Satoh, Hiroko Nagai, Daisuke KORI, Tsutomu Ogihara | 2019-09-17 |
| 10377775 | Method for producing polyalkylene glycol derivative having amino group at end | Yuki Suka, Yuji Harada, Shiori Nonaka | 2019-08-13 |
| 10241412 | Resist underlayer film composition, patterning process, and method for forming resist underlayer film | Hiroko Nagai, Daisuke KORI, Tsutomu Ogihara | 2019-03-26 |
| 10131603 | Method for reducing metal of sugar-alcohol compound and sugar-alcohol compound | Takayoshi NAKAHARA, Seiichiro Tachibana, Tsutomu Ogihara | 2018-11-20 |
| 10007183 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | Seiichiro Tachibana, Daisuke KORI, Tsutomu Ogihara, Kazumi Noda, Toshiharu Yano | 2018-06-26 |
| 9977330 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | Seiichiro Tachibana, Daisuke KORI, Tsutomu Ogihara, Kazumi Noda, Toshiharu Yano | 2018-05-22 |
| 9971245 | Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process | Tsutomu Ogihara, Kazunori Maeda | 2018-05-15 |
| 9899218 | Resist under layer film composition and patterning process | Jun Hatakeyama, Daisuke KORI | 2018-02-20 |
| 9805943 | Polymer for resist under layer film composition, resist under layer film composition, and patterning process | Rie Kikuchi, Seiichiro Tachibana, Tsutomu Ogihara | 2017-10-31 |
| 9708350 | Method for producing polyalkylene glycol derivative having amino group at end, polymerization initiator for use in the same, and alcohol compound as raw material for the polymerization initiator | Yuki Suka, Yuji Harada, Shiori Nonaka | 2017-07-18 |
| 9522979 | Fluorine-containing silicon compound, method for producing same, and method for producing fluorine-containing silicon resin | Yoshinori Taneda, Tsutomu Ogihara, Seiichiro Tachibana | 2016-12-20 |
| 9490144 | Quaternary ammonium salt compound, composition for forming a resist under layer film, and patterning process | Tsutomu Ogihara | 2016-11-08 |
| 9460934 | Wet strip process for an antireflective coating layer | Martin Glodde, Wu-Song Huang, Javier Perez, Takeshi Kinsho, Tsutomu Ogihara +1 more | 2016-10-04 |
| 9372404 | Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymer | Seiichiro Tachibana, Toshihiko Fujii, Kazumi Noda, Toshiharu Yano, Takeshi Kinsho | 2016-06-21 |
| 9284408 | Method for producing polyalkylene glycol derivative with narrow molecular weight distribution, and acetal group-containing alcohol compound for use therein and alkali metal salt thereof | Yuki Suka, Yuji Harada, Osamu Watanabe | 2016-03-15 |
| 9261788 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | Seiichiro Tachibana, Daisuke KORI, Tsutomu Ogihara, Kazumi Noda, Toshiharu Yano | 2016-02-16 |
| 9207534 | Nitrogen-containing monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Jun Hatakeyama, Tomohiro Kobayashi | 2015-12-08 |
| 9187404 | Method for producing polyalkylene glycol derivative having amino group at end, with narrow molecular weight distribution | Yuji Harada, Yuki Suka, Osamu Watanabe | 2015-11-17 |
| 9158191 | Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film | Katsuya Takemura, Takashi Miyazaki | 2015-10-13 |
| 9076738 | Composition for resist underlayer film, process for forming resist underlayer film, patterning process, and fullerene derivative | Toshihiko Fujii, Takeshi Kinsho, Tsutomu Ogihara | 2015-07-07 |
| 9057949 | Patterning process, resist composition, polymer, and polymerizable ester compound | Tomohiro Kobayashi, Jun Hatakeyama, Kazuhiro Katayama, Takeshi Kinsho | 2015-06-16 |