Issued Patents All Time
Showing 26–41 of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6909190 | Dual-damascene dielectric structures | Jay E. Uglow, Dave Hemker, Kenneth P. MacWilliams, Jeffrey C. Benzing, Timothy M. Archer | 2005-06-21 |
| 6894491 | Method and apparatus for metrological process control implementing complementary sensors | Yehiel Gotkis, Rodney Kistler, Aleksander Owczarz, David Hemker | 2005-05-17 |
| 6859765 | Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detection | Yehiel Gotkis, Vladimir Katz, David Hemker, Rodney Kistler | 2005-02-22 |
| 6808590 | Method and apparatus of arrayed sensors for metrological control | Yehiel Gotkis, Rodney Kistler, Aleksander Owczarz, David Hemker | 2004-10-26 |
| 6736720 | Apparatus and methods for controlling wafer temperature in chemical mechanical polishing | David Hemker | 2004-05-18 |
| 6322661 | Method and apparatus for controlling the volume of a plasma | Andrew D. Bailey, III, Alan M. Schoepp | 2001-11-27 |
| 6267545 | Semiconductor processing platform architecture having processing module isolation capabilities | Benjamin W. Mooring | 2001-07-31 |
| 6251770 | Dual-damascene dielectric structures and methods for making the same | Jay E. Uglow, Dave Hemker, Kenneth P. MacWilliams, Jeffrey C. Benzing, Timothy M. Archer | 2001-06-26 |
| 6194325 | Oxide etch process with high selectivity to nitride suitable for use on surfaces of uneven topography | Chan-Lon Yang, Jeffrey Marks, Kenneth S. Collins, David W. Groechel, Peter Keswick | 2001-02-27 |
| 6095741 | Dual sided slot valve and method for implementing the same | Tony R. Kroeker, Benjamin W. Mooring | 2000-08-01 |
| 6083412 | Plasma etch apparatus with heated scavenging surfaces | Michael R. Rice, Jeffrey Marks, David W. Groechel | 2000-07-04 |
| 5770099 | Plasma etch apparatus with heated scavenging surfaces | Michael R. Rice, Jeffrey Marks, David W. Groechel | 1998-06-23 |
| 5583737 | Electrostatic chuck usable in high density plasma | Kenneth S. Collins, John Trow, Joshua Chiu-Wing Tsui, Craig A. Roderick, Jeffrey Marks +2 more | 1996-12-10 |
| 5539609 | Electrostatic chuck usable in high density plasma | Kenneth S. Collins, John Trow, Joshua Chiu-Wing Tsui, Craig A. Roderick, Jeffrey Marks +2 more | 1996-07-23 |
| 5477975 | Plasma etch apparatus with heated scavenging surfaces | Michael R. Rice, Jeffrey Marks, David W. Groechel | 1995-12-26 |
| 5350479 | Electrostatic chuck for high power plasma processing | Kenneth S. Collins, John Trow, Joshua Chiu-Wing Tsui, Craig A. Roderick, Jeffrey Marks +1 more | 1994-09-27 |