Issued Patents All Time
Showing 1–25 of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12217154 | Method and apparatus with neural network operation and keyword spotting | Jin-hwan Park, Wonyong SUNG | 2025-02-04 |
| 6835275 | Reducing deposition of process residues on a surface in a chamber | Michael N. Grimbergen | 2004-12-28 |
| 6712927 | Chamber having process monitoring window | Michael N. Grimbergen | 2004-03-30 |
| 6699399 | Self-cleaning etch process | Zhi-Wen Sun, Weinan Jiang, Arthur Y. Chen, Gerald Yin, Ming-Hsun Yang +5 more | 2004-03-02 |
| 6504126 | Plasma reactor with coil antenna of concentrically spiral conductors with ends in common regions | Arthur H. Sato | 2003-01-07 |
| 6447636 | Plasma reactor with dynamic RF inductive and capacitive coupling control | Zhi-Wen Sun, Maocheng Li, John Holland, Arthur H. Sato, Valentin Todorov +2 more | 2002-09-10 |
| 6390019 | Chamber having improved process monitoring window | Michael N. Grimbergen | 2002-05-21 |
| 6379575 | Treatment of etching chambers using activated cleaning gas | Gerald Yin, Patrick Leahey, Jonathan D. Mohn, Waiching Chow, Arthur Y. Chen +2 more | 2002-04-30 |
| 6373022 | Plasma reactor with antenna of coil conductors of concentric helices offset along the axis of symmetry | Arthur H. Sato | 2002-04-16 |
| 6369348 | Plasma reactor with coil antenna of plural helical conductors with equally spaced ends | Arthur H. Sato | 2002-04-09 |
| 6369349 | Plasma reactor with coil antenna of interleaved conductors | Arthur H. Sato | 2002-04-09 |
| 6297468 | Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminal | Arthur H. Sato | 2001-10-02 |
| 6291793 | Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminal | Arthur H. Sato | 2001-09-18 |
| 6136211 | Self-cleaning etch process | Zhi-Wen Sun, Weinan Jiang, Arthur Y. Chen, Gerald Yin, Ming-Hsun Yang +5 more | 2000-10-24 |
| 6113731 | Magnetically-enhanced plasma chamber with non-uniform magnetic field | Hongching Shan, Roger Alan Lindley, Claes Bjorkman, Richard W. Plavidal, Bryan Pu +4 more | 2000-09-05 |
| 6100536 | Electron flood apparatus for neutralizing charge build-up on a substrate during ion implantation | Hiroyuki Ito, Robert J. Mitchell, Stephen Moffatt | 2000-08-08 |
| 6016131 | Inductively coupled plasma reactor with an inductive coil antenna having independent loops | Arthur H. Sato | 2000-01-18 |
| 5919382 | Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor | Arthur H. Sato | 1999-07-06 |
| 5907221 | Inductively coupled plasma reactor with an inductive coil antenna having independent loops | Arthur H. Sato | 1999-05-25 |
| 5863839 | Silicon and polycide plasma etch appplications by use of silicon-containing compounds | Dale A. Olson, Patty Hui-ing Tsai | 1999-01-26 |
| 5801386 | Apparatus for measuring plasma characteristics within a semiconductor wafer processing system and a method of fabricating and using same | Valentin Todorov, Yoshi Tanase, Arthur H. Sato, Peter Loewenhardt, Yan Ye +2 more | 1998-09-01 |
| 5705433 | Etching silicon-containing materials by use of silicon-containing compounds | Dale A. Olson, Patty Hui-ing Tsai | 1998-01-06 |
| 5683539 | Inductively coupled RF plasma reactor with floating coil antenna for reduced capacitive coupling | Arthur H. Sato | 1997-11-04 |
| 5667701 | Method of measuring the amount of capacitive coupling of RF power in an inductively coupled plasma | Arthur H. Sato | 1997-09-16 |
| 5565074 | Plasma reactor with a segmented balanced electrode for sputtering process materials from a target surface | Arthur H. Sato | 1996-10-15 |