| 12009228 |
Low temperature chuck for plasma processing systems |
Toan Q. Tran, Zilu Weng, Dmitry Lubomirsky, Satoru Kobayashi, Soonam Park +2 more |
2024-06-11 |
| 12002659 |
Apparatus for generating etchants for remote plasma processes |
David Benjaminson, Kenneth D. Schatz, Ryan Pakulski, Martin Yue Choy, Pratheep Gunaseelan +1 more |
2024-06-04 |
| 11915911 |
Two piece electrode assembly with gap for plasma control |
Tien Fak Tan, Saravjeet Singh, Dmitry Lubomirsky, Tae Wan Kim, Kenneth D. Schatz +1 more |
2024-02-27 |
| 11901161 |
Methods and apparatus for symmetrical hollow cathode electrode and discharge mode for remote plasma processes |
Saravana Kumar Natarajan, Kenneth D. Schatz, Dmitry Lubomirsky, Samartha Subramanya |
2024-02-13 |
| 11594428 |
Low temperature chuck for plasma processing systems |
Toan Q. Tran, Zilu Weng, Dmitry Lubomirsky, Satoru Kobayashi, Soonam Park +2 more |
2023-02-28 |
| 11373845 |
Methods and apparatus for symmetrical hollow cathode electrode and discharge mode for remote plasma processes |
Saravana Kumar Natarajan, Kenneth D. Schatz, Dmitry Lubomirsky, Samartha Subramanya |
2022-06-28 |
| 11361941 |
Methods and apparatus for processing a substrate |
Junghoon Kim, Dmitry Lubomirsky, Toan Q. Tran |
2022-06-14 |
| 10920320 |
Plasma health determination in semiconductor substrate processing reactors |
Junghoon Kim, Soonam Park, Dmitry Lubomirsky, Nikolai Kalnin |
2021-02-16 |
| 10752994 |
Apparatus and method for depositing a coating on a substrate at atmospheric pressure |
David N. Ruzic, Yuilun Wu, Ivan Shchelkanov, Jungmi Hong, Zihao Ouyang |
2020-08-25 |
| 10699879 |
Two piece electrode assembly with gap for plasma control |
Tien Fak Tan, Saravjeet Singh, Dmitry Lubomirsky, Tae Wan Kim, Kenneth D. Schatz +1 more |
2020-06-30 |
| 10593560 |
Magnetic induction plasma source for semiconductor processes and equipment |
Soonwook Jung, Junghoon Kim, Satoru Kobayashi, Kenneth D. Schatz, Soonam Park +1 more |
2020-03-17 |
| 10468285 |
High temperature chuck for plasma processing systems |
Toan Q. Tran, Sultan Malik, Dmitry Lubomirsky, Shambhu N. Roy, Satoru Kobayashi +2 more |
2019-11-05 |
| 10319649 |
Optical emission spectroscopy (OES) for remote plasma monitoring |
Soonam Park, Junghoon Kim, Dmitry Lubomirsky, Shankar Venkataraman |
2019-06-11 |
| 10167556 |
Apparatus and method for depositing a coating on a substrate at atmospheric pressure |
David N. Ruzic, Yuilun Wu, Ivan Shchelkanov, Jungmi Hong, Zihao Ouyang |
2019-01-01 |
| 9874524 |
In-situ spatially resolved plasma monitoring by using optical emission spectroscopy |
Junghoon Kim, Soonwook Jung, Soonam Park, Dmitry Lubomirsky |
2018-01-23 |
| 9773648 |
Dual discharge modes operation for remote plasma |
Yi-Heng Sen, Soonam Park, Dmitry Lubomirsky |
2017-09-26 |
| 9728437 |
High temperature chuck for plasma processing systems |
Toan Q. Tran, Sultan Malik, Dmitry Lubomirsky, Shambhu N. Roy, Satoru Kobayashi +2 more |
2017-08-08 |
| 9659753 |
Grooved insulator to reduce leakage current |
Sang Won Kang, Dongqing Yang, Raymond W. Lu, Peter M. Hillman, Nicholas Celeste +3 more |
2017-05-23 |
| 9528185 |
Plasma uniformity control by arrays of unit cell plasmas |
Sang Ki Nam, Ludovic Godet, Srinivas D. Nemani |
2016-12-27 |
| 9117855 |
Polarity control for remote plasma |
Yi-Heng Sen, Soonam Park, Dmitry Lubomirsky |
2015-08-25 |
| 7646150 |
Plasma display panel and manufacturing method of the same |
Jeong-Nam Kim, Hyea-Weon Shin, Yong-Shik Hwang |
2010-01-12 |
