Issued Patents All Time
Showing 1–25 of 79 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12423803 | Predicting tool induced shift using Moiré overlay targets | Yatir Linden, Nadav Gutman, Boaz Ophir | 2025-09-23 |
| 12204254 | Multi-layered moiré targets and methods for using the same in measuring misregistration of semiconductor devices | Yoel Feler | 2025-01-21 |
| 12105433 | Imaging overlay targets using moiré elements and rotational symmetry arrangements | Yoel Feler, Diana Shaphirov, Evgeni Gurevich, Vladimir Levinski | 2024-10-01 |
| 12094100 | Measurement of stitching error using split targets | Yoel Feler | 2024-09-17 |
| 12055859 | Overlay mark design for electron beam overlay | Inna Steely-Tarshish, Stefan Eyring, Yoel Feler, Eitan Hajaj, Ulrich Pohlmann +4 more | 2024-08-06 |
| 12013634 | Reduction or elimination of pattern placement error in metrology measurements | Yoel Feler, Vladimir Levinski, Roel Gronheid, Sharon Aharon, Evgeni Gurevich +1 more | 2024-06-18 |
| 11874605 | Verification metrology targets and their design | Michael Adel, Inna Tarshish-Shapir, Shiming Wei | 2024-01-16 |
| 11862524 | Overlay mark design for electron beam overlay | Inna Steely-Tarshish, Stefan Eyring, Yoel Feler, Eitan Hajaj, Ulrich Pohlmann +4 more | 2024-01-02 |
| 11809090 | Composite overlay metrology target | Anna Golotsvan, Inna Steely-Tarshish, Rawi Dirawi | 2023-11-07 |
| 11774863 | Induced displacements for improved overlay error metrology | Yoel Feler | 2023-10-03 |
| 11720031 | Overlay design for electron beam and scatterometry overlay measurements | Inna Steely-Tarshish, Stefan Eyring, Yoel Feler, Eitan Hajaj, Ulrich Pohlmann +4 more | 2023-08-08 |
| 11703767 | Overlay mark design for electron beam overlay | Inna Steely-Tarshish, Stefan Eyring, Yoel Feier, Eitan Hajaj, Ulrich Pohlmann +4 more | 2023-07-18 |
| 11686576 | Metrology target for one-dimensional measurement of periodic misregistration | Yoel Feler | 2023-06-27 |
| 11537043 | Reduction or elimination of pattern placement error in metrology measurements | Yoel Feler, Vladimir Levinski, Roel Gronheid, Sharon Aharon, Evgeni Gurevich +1 more | 2022-12-27 |
| 11532566 | Misregistration target having device-scaled features useful in measuring misregistration of semiconductor devices | Roie Volkovich, Liran Yerushalmi, Raviv Yohanan | 2022-12-20 |
| 11476144 | Single cell in-die metrology targets and measurement methods | — | 2022-10-18 |
| 11467503 | Field-to-field corrections using overlay targets | Enna Leshinsky-Altshuller, Inna Tarshish-Shapir, Diana Shaphirov, Guy Ben Dov, Roie Volkovich +1 more | 2022-10-11 |
| 11355375 | Device-like overlay metrology targets displaying Moiré effects | Roie Volkovich, Liran Yerushalmi, Raviv Yohanan | 2022-06-07 |
| 11256177 | Imaging overlay targets using Moiré elements and rotational symmetry arrangements | Yoel Feler, Diana Shaphirov, Evgeni Gurevich, Vladimir Levinski | 2022-02-22 |
| 11164307 | Misregistration metrology by using fringe Moiré and optical Moiré effects | Yoel Feler, Evgeni Gurevich, Vladimir Levinski, Alexander Svizher | 2021-11-02 |
| 11137692 | Metrology targets and methods with oblique periodic structures | Yoel Feler, Alexander Svizher, Vladimir Levinski, Inna Tarshish-Shapir | 2021-10-05 |
| 11119419 | Moiré target and method for using the same in measuring misregistration of semiconductor devices | — | 2021-09-14 |
| 11073768 | Metrology target for scanning metrology | Andrew V. Hill, Amnon Manassen, Gilad Laredo, Yoel Feler, Vladimir Levinski | 2021-07-27 |
| 10990022 | Field-to-field corrections using overlay targets | Enna Leshinsky-Altshuller, Inna Tarshish-Shapir, Diana Shaphirov, Guy Ben Dov, Roie Volkovich +1 more | 2021-04-27 |
| 10726169 | Target and process sensitivity analysis to requirements | Michael Adel, Nuriel Amir, Tal Shusterman, David Gready, Sergey Borodyansky | 2020-07-28 |