JH

John J. Hench

KL Kla-Tencor: 22 patents #54 of 1,394Top 4%
TL Tokyo Electron Limited: 9 patents #845 of 5,567Top 20%
KL Kla: 6 patents #58 of 758Top 8%
TY Tymphany: 1 patents #3 of 10Top 30%
Overall (All Time): #92,395 of 4,157,543Top 3%
36
Patents All Time

Issued Patents All Time

Showing 25 most recent of 36 patents

Patent #TitleCo-InventorsDate
12379668 Methods and systems for measurement of semiconductor structures with multi-pass statistical optimization Daniel J. Haxton 2025-08-05
12320763 Full beam metrology for x-ray scatterometry systems Antonio Arion Gellineau, Thaddeus Gerard Dziura, Andrei Veldman, Sergey Zalubovsky 2025-06-03
11428650 Computationally efficient x-ray based overlay measurement Andrei V. Shchegrov, Michael S. Bakeman 2022-08-30
11313816 Full beam metrology for x-ray scatterometry systems Antonio Arion Gellineau, Thaddeus Gerard Dziura, Andrei Veldman, Sergey Zalubovsky 2022-04-26
11305178 Chess variant including additional player piece and method of play 2022-04-19
11099137 Visualization of three-dimensional semiconductor structures Aaron Rosenberg, Jonathan Iloreta, Thaddeus Gerard Dziura, Antonio Arion Gellineau, Yin Xu +5 more 2021-08-24
11073487 Methods and systems for characterization of an x-ray beam with high spatial resolution Alexander N. Bykanov, Nikolay Artemiev, Joseph A. Di Regolo, Antonio Arion Gellineau, Alexander Kuznetsov +1 more 2021-07-27
10983227 On-device metrology using target decomposition Antonio Arion Gellineau, Alexander Kuznetsov 2021-04-20
10794839 Visualization of three-dimensional semiconductor structures Aaron Rosenberg, Jonathan Iloreta, Thaddeus Gerard Dziura, Antonio Arion Gellineau, Yin Xu +5 more 2020-10-06
10775323 Full beam metrology for X-ray scatterometry systems Antonio Arion Gellineau, Thaddeus Gerard Dziura, Andrei Veldman, Sergey Zalubovsky 2020-09-15
10677586 Phase revealing optical and X-ray semiconductor metrology Andrei Veldman 2020-06-09
10545104 Computationally efficient X-ray based overlay measurement Andrei V. Shchegrov, Michael S. Bakeman 2020-01-28
10481111 Calibration of a small angle X-ray scatterometry based metrology system Antonio Arion Gellineau, Nikolay Artemiev, Joseph A. Di Regolo 2019-11-19
10325004 Method of optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology Thaddeus Gerard Dziura, Yung-Ho Alex Chuang, Bin-Ming Benjamin Tsai, Xuefeng Liu 2019-06-18
10324050 Measurement system optimization for X-ray based metrology Andrei V. Shchegrov, Michael S. Bakeman 2019-06-18
10062157 Compressive sensing for metrology Stilian Ivanov Pandev, Alexander Kuznetsov, Gregory Brady, Andrei V. Shchegrov, Noam Sapiens 2018-08-28
9846132 Small-angle scattering X-ray metrology systems and methods Michael S. Bakeman, Andrei V. Shchegrov, Ady Levy, Guorong V. Zhuang 2017-12-19
9523800 Computation efficiency by iterative spatial harmonics order truncation Andrei Veldman 2016-12-20
9518916 Compressive sensing for metrology Stilian Ivanov Pandev, Alexander Kuznetsov, Gregory Brady, Andrei V. Shchegrov, Noam Sapiens 2016-12-13
9494535 Scatterometry-based imaging and critical dimension metrology Abdurrahman Sezginer, Michael S. Bakeman 2016-11-15
9310296 Optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology Thaddeus Gerard Dziura, Yung-Ho Alex Chuang, Bin-Ming Benjamin Tsai, Xuefeng Liu 2016-04-12
8798966 Measuring critical dimensions of a semiconductor structure Daniel Wack, Edward Ratner, Yaoming SHI, Andrei Veldman 2014-08-05
8760649 Model-based metrology using tesselation-based discretization Andrei Veldman 2014-06-24
8666703 Method for automated determination of an optimally parameterized scatterometry model Jason Ferns, Serguei Komarov, Thaddeus Gerard Dziura 2014-03-04
8381140 Wide process range library for metrology Wen Jin, Junwei Bao 2013-02-19