Issued Patents All Time
Showing 25 most recent of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8619236 | Determining lithographic set point using optical proximity correction verification simulation | Edward W. Conrad, Jacek G. Smolinski | 2013-12-31 |
| 8577489 | Diagnosing in-line critical dimension control adjustments using optical proximity correction verification | Kenneth T. Settlemyer, Jr. | 2013-11-05 |
| 8499260 | Optical proximity correction verification accounting for mask deviations | Kenneth T. Settlemyer, Jr. | 2013-07-30 |
| 8219964 | Method for creating electrically testable patterns | Edward W. Conrad, Jacek G. Smolinski | 2012-07-10 |
| 8166423 | Photomask design verification | Scott M. Mansfield, Gregory J. Dick, Ioana Graur | 2012-04-24 |
| 7562337 | OPC verification using auto-windowed regions | Gregory J. Dick, Donald P. Perley, Jacek G. Smolinski | 2009-07-14 |
| 7492941 | Mask defect analysis system | Orest Bula, Edward W. Conrad, William C. Leipold, Michael S. Hibbs, Joshua J. Krueger | 2009-02-17 |
| 7492940 | Mask defect analysis system | Orest Bula, Edward W. Conrad, William C. Leipold, Michael S. Hibbs, Joshua J. Krueger | 2009-02-17 |
| 7269808 | Design verification | James A. Culp, John D. Nickel, Jacek G. Smolinski | 2007-09-11 |
| 7257247 | Mask defect analysis system | Orest Bula, Edward W. Conrad, William C. Leipold, Michael S. Hibbs, Joshua J. Krueger | 2007-08-14 |
| 6766507 | Mask/wafer control structure and algorithm for placement | Stephen E. Knight, Joshua J. Krueger, Matthew Nicholls, Jed H. Rankin | 2004-07-20 |
| 6577406 | Structure for lithographic focus control features | Orest Bula, Emily E. Fisch | 2003-06-10 |
| 6539321 | Method for edge bias correction of topography-induced linewidth variation | Orest Bula, Edward W. Conrad, William C. Leipold | 2003-03-25 |
| 6395624 | Method for forming implants in semiconductor fabrication | Randy W. Mann | 2002-05-28 |
| 6395438 | Method of etch bias proximity correction | Orest Bula, Edward W. Conrad, William C. Leipold | 2002-05-28 |
| 6369397 | SPM base focal plane positioning | Brent A. Anderson, Steven J. Holmes, Peter H. Mitchell, Robert A. Myers | 2002-04-09 |
| 6338921 | Mask with linewidth compensation and method of making same | David V. Horak, Randy W. Mann, Jed H. Rankin, Andrew J. Watts | 2002-01-15 |
| 6303416 | Method to reduce plasma etch fluting | Mary Conroy Bushey, Premlatha Jagannathan, Walter E. Mlyriko, Dianne L. Sundling | 2001-10-16 |
| 6300228 | Multiple precipitation doping process | James W. Adkisson, John J. Ellis-Monaghan, Randy W. Mann, Edward J. Nowak, Kirk D. Peterson | 2001-10-09 |
| 6215190 | Borderless contact to diffusion with respect to gate conductor and methods for fabricating | Jonathan D. Chapple-Sokol, Charles W. Koburger, III, Michael Lercel, Randy W. Mann, James S. Nakos +3 more | 2001-04-10 |
| 6147394 | Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby | Steven J. Holmes, Robert K. Leidy, Walter E. Mlynko, Edward W. Sengle | 2000-11-14 |
| 6015750 | Method for improving visibility of alignment target in semiconductor processing | Steven J. Holmes, Robert K. Leidy | 2000-01-18 |
| 5972570 | Method of photolithographically defining three regions with one mask step and self aligned isolation structure formed thereby | Steven J. Holmes, Robert K. Leidy, Walter E. Mlynko, Edward W. Sengle | 1999-10-26 |
| 5760483 | Method for improving visibility of alignment targets in semiconductor processing | Steven J. Holmes, Robert K. Leidy | 1998-06-02 |
| 5614990 | Illumination tailoring system using photochromic filter | Joseph E. Gortych, Michael S. Hibbs | 1997-03-25 |