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Ex situ coating of chamber components for semiconductor processing |
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Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition |
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Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma |
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Wafer level uniformity control in remote plasma film deposition |
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Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition |
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Ex situ coating of chamber components for semiconductor processing |
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| 11101164 |
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition |
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| 11004662 |
Temperature controlled spacer for use in a substrate processing chamber |
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2021-05-11 |
| 10760158 |
Ex situ coating of chamber components for semiconductor processing |
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Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition |
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Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma |
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| 9591738 |
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Liqi Wu, Yung-Yi Lee |
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Chunming Zhou, Liqi Wu, Karthik S. Colinjivadi, Emery Kuo, KieJin Park |
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Ashing method |
David Cheung |
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Gas flow distribution receptacles, plasma generator systems, and methods for performing plasma stripping processes |
Woody Chung, Anirban Guha, David Cheung |
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Submicron particle removal |
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2009-05-05 |
