| 12331402 |
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition |
Rachel E. Batzer, Huatan Qiu, Bhadri N. Varadarajan, Patrick Breiling, Bo Gong +3 more |
2025-06-17 |
| 12000047 |
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition |
Rachel E. Batzer, Huatan Qiu, Bhadri N. Varadarajan, Patrick Breiling, Bo Gong +3 more |
2024-06-04 |
| 11674226 |
Separation of plasma suppression and wafer edge to improve edge film thickness uniformity |
Fayaz Shaikh |
2023-06-13 |
| 11608559 |
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition |
Rachel E. Batzer, Huatan Qiu, Bhadri N. Varadarajan, Patrick Breiling, Bo Gong +3 more |
2023-03-21 |
| 11101164 |
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition |
Rachel E. Batzer, Huatan Qiu, Bhadri N. Varadarajan, Patrick Breiling, Bo Gong +3 more |
2021-08-24 |
| 11004662 |
Temperature controlled spacer for use in a substrate processing chamber |
Huatan Qiu, Ryan Senff |
2021-05-11 |
| 10604841 |
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition |
Rachel E. Batzer, Huatan Qiu, Bhadri N. Varadarajan, Patrick Breiling, Bo Gong +3 more |
2020-03-31 |
