Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12362153 | Pedestal setup using camera wafer | Prasanna Kulkarni, Ted TAN, Vivekanandan Krishnaswamy, Boonyarit Woonprasert, Shawn Fiedler | 2025-07-15 |
| 12331402 | Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition | Huatan Qiu, Bhadri N. Varadarajan, Patrick Breiling, Bo Gong, Will Schlosser +3 more | 2025-06-17 |
| 12116669 | Integrated showerhead with improved hole pattern for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition | Zhe Gui, Galbokka Hewage Layan Savithra | 2024-10-15 |
| 12000047 | Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition | Huatan Qiu, Bhadri N. Varadarajan, Patrick Breiling, Bo Gong, Will Schlosser +3 more | 2024-06-04 |
| 11920239 | Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma | Bhadri N. Varadarajan, Bo Gong, Huatan Qiu, Bart J. van Schravendijk, Geoffrey Hohn | 2024-03-05 |
| 11702748 | Wafer level uniformity control in remote plasma film deposition | Geoffrey Hohn, Huatan Qiu, Guangbi Yuan, Zhe Gui | 2023-07-18 |
| 11608559 | Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition | Huatan Qiu, Bhadri N. Varadarajan, Patrick Breiling, Bo Gong, Will Schlosser +3 more | 2023-03-21 |
| D948658 | High density hole pattern dual plenum hole showerhead assembly | Aaron Miller, Aaron Durbin, Vivekanandan Krishnaswamy | 2022-04-12 |
| 11101164 | Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition | Huatan Qiu, Bhadri N. Varadarajan, Patrick Breiling, Bo Gong, Will Schlosser +3 more | 2021-08-24 |
| 11015247 | Integrated showerhead with improved hole pattern for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition | Zhe Gui, Galbokka Hewage Layan Savithra | 2021-05-25 |
| 10604841 | Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition | Huatan Qiu, Bhadri N. Varadarajan, Patrick Breiling, Bo Gong, Will Schlosser +3 more | 2020-03-31 |
| 9828672 | Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma | Bhadri N. Varadarajan, Bo Gong, Huatan Qiu, Bart J. van Schravendijk, Geoffrey Hohn | 2017-11-28 |