Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition

Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition

US Patent 10604841 · Granted Mar 31, 2020

Estimated economic value: $259,981,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Threaded nozzle insert2025
Three-dimensional wildfire monitoring and control method and system for power tr2025
Plasma-enhanced deposition of film stacks2025
Graphene integration2025
Switching device and 3D printing apparatus2025
Conformal deposition of silicon carbide films using heterogeneous precursor inte2025
Conformal deposition of silicon carbide films using heterogeneous precursor inte2025
Conformal deposition of silicon carbide films using heterogeneous precursor inte2025
Pedestal setup using camera wafer2025
Integrated showerhead with thermal control for delivering radical and precursor 2025
Integrated showerhead with thermal control for delivering radical and precursor 2025
Integrated showerhead with thermal control for delivering radical and precursor 2025