{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma", "item": "https://www.patentleaderboard.com/patent/9828672"}]}

Home › Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma

Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma

US Patent 9828672 · Granted Nov 28, 2017

Estimated economic value: $38,638,000 ⓘ

Assignee

Lam Research

Inventors

Bhadri N. Varadarajan (56 patents)
Bo Gong (45 patents)
Rachel E. Batzer (13 patents)
Huatan Qiu (22 patents)
Bart J. van Schravendijk (126 patents)
Geoffrey Hohn (12 patents)

View full patent text on Google Patents →