Issued Patents All Time
Showing 25 most recent of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7670961 | Reduction of cracking in low-k spin-on dielectric films | Howard Shillingford, Garkay Joseph Leung, Mary Matera-Longo, John Rapp | 2010-03-02 |
| 6635118 | Aqueous cleaning of polymer apply equipment | Richard A. Cormack, Gerard V. Capogna, Felice J. Mancaruso, Krishna G. Sachdev | 2003-10-21 |
| 6153696 | Process for forming carbonates of hydroxyaromatic compounds | Gregory Breyta, Daniel J. Dawson, Moahmoud Mostafa Khojasteh, Ranee W. Kwong, Elwood Herbert Macy +5 more | 2000-11-28 |
| 5976710 | Low TCE polyimides as improved insulator in multilayer interconnect structures | Krishna G. Sachdev, John P. Hummel, Sundar M. Kamath, Robert N. Lang, Anton Nendaic +1 more | 1999-11-02 |
| 5422223 | Silicon-containing positive resist and use in multilayer metal structures | Krishna G. Sachdev, Joel R. Whitaker | 1995-06-06 |
| 5399462 | Method of forming sub-half micron patterns with optical lithography using bilayer resist compositions comprising a photosensitive polysilsesquioxane | Krishna G. Sachdev, Premlatha Jagannathan, Robert N. Lang, Ratnam Sooriyakumaran, Joel R. Whitaker | 1995-03-21 |
| 5385804 | Silicon containing negative resist for DUV, I-line or E-beam lithography comprising an aromatic azide side group in the polysilsesquioxane polymer | Jagannathan Premlatha, Ratnam Sooriyakumaran | 1995-01-31 |
| 5338818 | Silicon containing positive resist for DUV lithography | William R. Brunsvold, Premlatha Jagannathan, Steve S. Miura, Melvin Montgomery, Ratnam Sooriyakumaran | 1994-08-16 |
| 5322765 | Dry developable photoresist compositions and method for use thereof | Nicholas J. Clecak, Willard E. Conley, Ranee W. Kwong, Leo L. Linehan, Scott A. MacDonald +2 more | 1994-06-21 |
| 5312717 | Residue free vertical pattern transfer with top surface imaging resists | John C. Forster, Leo L. Linehan, Scott A. MacDonald, K. Paul Muller, Walter E. Mlynko +1 more | 1994-05-17 |
| 5296332 | Crosslinkable aqueous developable photoresist compositions and method for use thereof | Willard E. Conley, Premlatha Jagannathan, Ahmad D. Katnani, Ranee W. Kwong, Leo L. Linehan +2 more | 1994-03-22 |
| 5240812 | Top coat for acid catalyzed resists | Willard E. Conley, Ranee W. Kwong, Richard J. Kvitek, Robert N. Lang, Christopher F. Lyons +3 more | 1993-08-31 |
| 5213704 | Process for making a compliant thermally conductive compound | Herbert R. Anderson, Jr., Richard B. Booth, Lawrence D. David, Mark Neisser, Mark A. Takacs | 1993-05-25 |
| 5114826 | Photosensitive polyimide compositions | Ranee W. Kwong, Krishna G. Sachdev | 1992-05-19 |
| 5115090 | Viscosity stable, essentially gel-free polyamic acid compositions | Krishna G. Sachdev, John P. Hummel, Ranee W. Kwong, Robert N. Lang, Leo L. Linehan | 1992-05-19 |
| 5094769 | Compliant thermally conductive compound | Herbert R. Anderson, Jr., Richard B. Booth, Lawrence D. David, Mark Neisser, Mark A. Takacs | 1992-03-10 |
| 4978594 | Fluorine-containing base layer for multi-layer resist processes | James A. Bruce, Michael L. Kerbaugh, Ranee W. Kwong, Tanya N. Lee, Harold G. Linde | 1990-12-18 |
| 4826564 | Method of selective reactive ion etching of substrates | Brian H. Desilets, Richard D. Kaplan, Krishna G. Sachdev, Susan Sanchez | 1989-05-02 |
| 4772346 | Method of bonding inorganic particulate material | Herbert R. Anderson, Jr., Constance J. Araps, Renuka S. Divakaruni, Daniel P. Kirby, Robert W. Nufer +3 more | 1988-09-20 |
| 4692205 | Silicon-containing polyimides as oxygen etch stop and dual dielectric coatings | Krishna G. Sachdev, Ranee W. Kwong, Mani R. Gupta, Mark S. Chace | 1987-09-08 |
| 4665006 | Positive resist system having high resistance to oxygen reactive ion etching | Krishna G. Sachdev, Ranee W. Kwong, Mahmoud Khojasteh | 1987-05-12 |
| 4599243 | Use of plasma polymerized organosilicon films in fabrication of lift-off masks | Krishna G. Sachdev | 1986-07-08 |
| 4562091 | Use of plasma polymerized orgaosilicon films in fabrication of lift-off masks | Krishna G. Sachdev | 1985-12-31 |
| 4525722 | Chemical heat amplification in thermal transfer printing | Krishna G. Sachdev, Ari Aviram, Mark A. Wizner | 1985-06-25 |
| 4519872 | Use of depolymerizable polymers in the fabrication of lift-off structure for multilevel metal processes | Herbert R. Anderson, Jr., Krishna G. Sachdev | 1985-05-28 |