Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12211717 | Spatial pattern loading measurement with imaging metrology | Eric Ng, Mehdi Vaez-Iravani, Todd Egan, Venkatakaushik Voleti | 2025-01-28 |
| 12062583 | Optical metrology models for in-line film thickness measurements | Eric Ng, Sergey Starik, Todd Egan | 2024-08-13 |
| 11898249 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2024-02-13 |
| 11613812 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2023-03-28 |
| 11609183 | Methods and systems to measure properties of products on a moving blade in electronic device manufacturing machines | Todd Egan, Avishek Ghosh, Guoheng Zhao | 2023-03-21 |
| 11226234 | Spectrum shaping devices and techniques for optical characterization applications | Guoheng Zhao, Todd Egan | 2022-01-18 |
| 10886155 | Optical stack deposition and on-board metrology | Mingwei Zhu, Zihao Yang, Nag B. Patibandla, Daniel Lee Diehl, Yong Cao +5 more | 2021-01-05 |
| 10793954 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2020-10-06 |
| 10527407 | In-situ metrology method for thickness measurement during PECVD processes | Khokan Chandra Paul, Todd Egan, Mehdi Vaez-Iravani, Jeongmin Lee, Dale R. Du Bois +1 more | 2020-01-07 |
| 10522375 | Monitoring system for deposition and method of operation thereof | Majeed A. Foad, Ralf Hofmann, Thomas Nowak, Todd Egan, Mehdi Vaez-Iravani | 2019-12-31 |
| 10281261 | In-situ metrology method for thickness measurement during PECVD processes | Khokan Chandra Paul, Todd Egan, Mehdi Vaez-Iravani, Jeongmin Lee, Dale R. Du Bois +1 more | 2019-05-07 |
| 10260855 | Electroplating tool with feedback of metal thickness distribution and correction | Todd Egan, Robert O. Miller, Abraham Ravid, Bridger Earl HOERNER, Robert W. Batz, Jr. +1 more | 2019-04-16 |
| 10234261 | Fast and continuous eddy-current metrology of a conductive film | Dmitry A. Dzilno, Todd Egan, Jeffrey C. Hudgens, Nir Merry | 2019-03-19 |
| 10060032 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2018-08-28 |
| 10030306 | PECVD apparatus and process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2018-07-24 |
| 9870935 | Monitoring system for deposition and method of operation thereof | Majeed A. Foad, Ralf Hofmann, Thomas Nowak, Todd Egan, Mehdi Vaez-Iravani | 2018-01-16 |
| 9816187 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2017-11-14 |
| 9458537 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2016-10-04 |
| 9335151 | Film measurement | Todd Egan, Dmitry A. Dzilno | 2016-05-10 |
| 9157730 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2015-10-13 |
| 8698889 | Metrology system for imaging workpiece surfaces at high robot transfer speeds | Abraham Ravid, Todd Egan, Karen Lingel, Mitchell DiSanto, Hari Kishore Ambal | 2014-04-15 |
| 8130373 | Metrology of thin film devices using an addressable micromirror array | Edgar Genio | 2012-03-06 |
| 8027031 | Spectrometric metrology of workpieces using a permanent window as a spectral reference | Edgar Genio | 2011-09-27 |
| 8018586 | Metrology of thin film devices using an addressable micromirror array | Edgar Genio | 2011-09-13 |
| 7911603 | Spectrometric metrology of workpieces using a permanent window as a spectral reference | Edgar Genio | 2011-03-22 |