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Method of submicron metallization using electrochemical deposition of recesses including a first deposition at a first current density and a second deposition at an increased current density |
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Contact assemblies, methods for making contact assemblies, and plating machines with contact assemblies for plating microelectronic workpieces |
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2005-09-06 |
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Contact assemblies, methods for making contact assemblies, and plating machines with contact assemblies for plating microelectronic workpieces |
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2000-07-18 |
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Methods for plating semiconductor workpieces using a workpiece-engaging electrode assembly with sealing boot |
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1999-12-14 |