RJ

Robert W. Batz, Jr.

SE Semitool: 16 patents #20 of 141Top 15%
Applied Materials: 6 patents #1,918 of 7,310Top 30%
Overall (All Time): #195,687 of 4,157,543Top 5%
22
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
10260855 Electroplating tool with feedback of metal thickness distribution and correction Todd Egan, Edward W. Budiarto, Robert O. Miller, Abraham Ravid, Bridger Earl HOERNER +1 more 2019-04-16
9234293 Electrolytic copper process using anion permeable barrier Rajesh Baskaran, Bioh Kim, Thomas Ritzdorf, John L. Klocke, Kyle M. Hanson 2016-01-12
8961771 Electrolytic process using cation permeable barrier Rajesh Baskaran, Bioh Kim, Tom Ritzdorf, John L. Klocke, Kyle M. Hanson 2015-02-24
8852417 Electrolytic process using anion permeable barrier Rajesh Baskaran, Bioh Kim, Tom Ritzdorf, John L. Klocke, Kyle M. Hanson 2014-10-07
8236159 Electrolytic process using cation permeable barrier Rajesh Baskaran, Bioh Kim, Tom Ritzdorf, John L. Klocke, Kyle M. Hanson 2012-08-07
8123926 Electrolytic copper process using anion permeable barrier Rajesh Baskaran, Bioh Kim, Tom Ritzdorf, John L. Klocke, Kyle M. Hanson 2012-02-28
7252714 Apparatus and method for thermally controlled processing of microelectronic workpieces Kyle M. Hanson, Rajesh Baskaran, Nolan L. Zimmerman, Zhongmin Hu, Gregory J. Wilson +1 more 2007-08-07
7144805 Method of submicron metallization using electrochemical deposition of recesses including a first deposition at a first current density and a second deposition at an increased current density Linlin Chen, Lyndon Graham, Thomas Ritzdorf, Dakin Fulton 2006-12-05
7048841 Contact assemblies, methods for making contact assemblies, and plating machines with contact assemblies for plating microelectronic workpieces John M. Pedersen, John L. Klocke, Linlin Chen 2006-05-23
6939448 Contact assemblies, methods for making contact assemblies, and plating machines with contact assemblies for plating microelectronic workpieces John M. Pedersen, John L. Klocke, Linlin Chen 2005-09-06
6911127 Contact assemblies, methods for making contact assemblies, and plating machines with contact assemblies for plating microelectronic workpieces John M. Pedersen, John L. Klocke, Linlin Chen 2005-06-28
6849167 Electroplating reactor including back-side electrical contact apparatus Daniel J. Woodruff, Kyle M. Hanson, James T. Kuechmann 2005-02-01
6805778 Contact assembly for supplying power to workpieces during electrochemical processing Kenneth C. Haugan, Harry J. Geyer, Robert W. Berner 2004-10-19
6806186 Submicron metallization using electrochemical deposition Linlin Chen, Lyndon Graham, Thomas Ritzdorf, Dakin Fulton 2004-10-19
6669834 Method for high deposition rate solder electroplating on a microelectronic workpiece Scot Conrady, Thomas Ritzdorf 2003-12-30
6602383 Apparatus and methods for controlling workpiece surface exposure to processing liquids during the fabrication of microelectronic components Reed A. Blackburn, Steven Edward Kelly, James Doolittle 2003-08-05
6527926 Electroplating reactor including back-side electrical contact apparatus Daniel J. Woodruff, Kyle M. Hanson, James T. Kuechmann 2003-03-04
6527925 Contact assemblies, methods for making contact assemblies, and plating machines with contact assemblies for plating microelectronic workpieces John M. Pedersen, John L. Klocke, Linlin Chen 2003-03-04
6461494 Methods for plating semiconductor workpieces using a workpiece-engaging electrode assembly with sealing boot Kenneth C. Haugan, Harry J. Geyer, Robert W. Berner 2002-10-08
6334937 Apparatus for high deposition rate solder electroplating on a microelectronic workpiece Scot Conrady, Thomas Ritzdorf 2002-01-01
6090711 Methods for controlling semiconductor workpiece surface exposure to processing liquids Reed A. Blackburn, Steven Edward Kelly 2000-07-18
6001234 Methods for plating semiconductor workpieces using a workpiece-engaging electrode assembly with sealing boot Kenneth C. Haugan, Harry J. Geyer, Robert W. Berner 1999-12-14