Issued Patents All Time
Showing 26–50 of 54 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7385699 | Apparatus and methods for detecting overlay errors using scatterometry | Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith +3 more | 2008-06-10 |
| 7381975 | In plane drift compensation | Michael L. Young | 2008-06-03 |
| 7379183 | Apparatus and methods for detecting overlay errors using scatterometry | Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith +6 more | 2008-05-27 |
| 7361941 | Calibration standards and methods | Gian Francesco Lorusso, Luca Grella, David L. Adler, Ian Smith | 2008-04-22 |
| 7355709 | Methods and systems for optical and non-optical measurements of a substrate | Gary R. Dickerson | 2008-04-08 |
| 7332438 | Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool | Kurt Lehman, Charles Chen, Ronald L. Allen, Robert Shinagawa, Anantha R. Sethuraman +3 more | 2008-02-19 |
| 7317531 | Apparatus and methods for detecting overlay errors using scatterometry | Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith +10 more | 2008-01-08 |
| 7301634 | Apparatus and methods for detecting overlay errors using scatterometry | Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith +7 more | 2007-11-27 |
| 7269816 | Driven inspection or measurement | — | 2007-09-11 |
| 7242477 | Apparatus and methods for detecting overlay errors using scatterometry | Walter D. Mieher, Ady Levy, Boris Golovanesky, Michael Friedmann, Ian Smith +4 more | 2007-07-10 |
| 7199874 | Darkfield inspection system having a programmable light selection array | Paul Sullivan, David W. Shortt, George Kren | 2007-04-03 |
| 7175503 | Methods and systems for determining a characteristic of polishing within a zone on a specimen from combined output signals of an eddy current device | Kurt Lehman, Charles Chen, Ronald L. Allen, Robert Shinagawa, Anantha R. Sethuraman +3 more | 2007-02-13 |
| 7106432 | Surface inspection system and method for using photo detector array to detect defects in inspection surface | Evan R. Mapoles, Grace Hsiu-Ling Chen, David W. Shortt | 2006-09-12 |
| 7068363 | Systems for inspection of patterned or unpatterned wafers and other specimen | Mike Kirk, Mehdi Vaez-Iravani | 2006-06-27 |
| 7061598 | Darkfield inspection system having photodetector array | David W. Shortt | 2006-06-13 |
| 7052369 | Methods and systems for detecting a presence of blobs on a specimen during a polishing process | Kurt Lehman, Charles Chen, Ronald L. Allen, Robert Shinagawa, Anantha R. Sethuraman +3 more | 2006-05-30 |
| 7030018 | Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool | Kurt Lehman, Charles Chen, Ronald L. Allen, Robert Shinagawa, Anantha R. Sethuraman +3 more | 2006-04-18 |
| 7009696 | Method and apparatus for scanning, stitching, and damping measurements of a double-sided metrology inspection tool | Paul Sullivan, George Kren, Rodney Smedt, Hans J. Hansen, David W. Shortt +1 more | 2006-03-07 |
| 7002677 | Darkfield inspection system having a programmable light selection array | Paul Sullivan, David W. Shortt, George Kren | 2006-02-21 |
| 6935922 | Methods and systems for generating a two-dimensional map of a characteristic at relative or absolute locations of measurement spots on a specimen during polishing | Kurt Lehman, Charles Chen, Ronald L. Allen, Robert Shinagawa, Anantha R. Sethuraman +3 more | 2005-08-30 |
| 6886153 | Design driven inspection or measurement for semiconductor using recipe | — | 2005-04-26 |
| 6884146 | Systems and methods for characterizing a polishing process | Kurt Lehman, Charles Chen, Ronald L. Allen, Robert Shinagawa, Anantha R. Sethuraman +3 more | 2005-04-26 |
| 6866559 | Windows configurable to be coupled to a process tool or to be disposed within an opening in a polishing pad | Kurt Lehman, Charles Chen, Ronald L. Allen, Robert Shinagawa, Anantha R. Sethuraman +3 more | 2005-03-15 |
| 6770868 | Critical dimension scanning electron microscope | David E. Clapper | 2004-08-03 |
| 6770879 | Motion picture output from electron microscope | Amir Azordegan, Bharat Marathe, David R. Bakker | 2004-08-03 |