NS

Nicole Saulnier

IBM: 54 patents #1,518 of 70,183Top 3%
TE Tessera: 5 patents #92 of 271Top 35%
SS Stmicroelectronics Sa: 3 patents #449 of 1,676Top 30%
AS Adeia Semiconductor Solutions: 1 patents #22 of 57Top 40%
📍 Albany, NY: #20 of 790 inventorsTop 3%
🗺 New York: #1,375 of 115,490 inventorsTop 2%
Overall (All Time): #38,971 of 4,157,543Top 1%
60
Patents All Time

Issued Patents All Time

Showing 26–50 of 60 patents

Patent #TitleCo-InventorsDate
10833267 Structure and method to form phase change memory cell with self- align top electrode contact Injo Ok, Myung-Hee Na, Balasubramanian Pranatharthiharan 2020-11-10
10832945 Techniques to improve critical dimension width and depth uniformity between features with different layout densities Indira Seshadri, Lawrence A. Clevenger, Leigh Anne H. Clevenger, Gauri Karve, Fee Li Lie +3 more 2020-11-10
10803933 Self-aligned high density and size adjustable phase change memory Injo Ok, Myung-Hee Na, Balasubramanian Pranatharthiharan 2020-10-13
10741756 Phase change memory with a patterning scheme for tantalum nitride and silicon nitride layers Injo Ok, Iqbal Rashid Saraf, Kevin W. Brew 2020-08-11
10725454 Mask process aware calibration using mask pattern fidelity inspections Ravi K. Bonam, Michael M. Crouse, Derren N. Dunn 2020-07-28
10622250 Dielectric gap fill evaluation for integrated circuits Isabel Cristina Chu, Lawrence A. Clevenger, Leigh Anne H. Clevenger, Ekmini Anuja De Silva, Gauri Karve +3 more 2020-04-14
10600868 FinFET gate cut after dummy gate removal John R. Sporre, Siva Kanakasabapathy, Andrew M. Greene, Jeffrey C. Shearer 2020-03-24
10573808 Phase change memory with a dielectric bi-layer Iqbal Rashid Saraf, Kevin W. Brew, Injo Ok, Robert L. Bruce 2020-02-25
10546774 Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogs Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Sivananda K. Kanakasabapathy, Yann Mignot +2 more 2020-01-28
10529569 Self aligned pattern formation post spacer etchback in tight pitch configurations Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Nelson Felix, Sivananda K. Kanakasabapathy +2 more 2020-01-07
10515894 Enhanced self-alignment of vias for a semiconductor device Benjamin D. Briggs, Lawrence A. Clevenger, Bartlet H. DeProspo, Michael Rizzolo 2019-12-24
10395985 Self aligned conductive lines with relaxed overlay Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Sivananda K. Kanakasabapathy, Yann Mignot +2 more 2019-08-27
10381348 Structure and method for equal substrate to channel height between N and P fin-FETs Lawrence A. Clevenger, Leigh Anne H. Clevenger, Mona A. Ebrish, Gauri Karve, Fee Li Lie +2 more 2019-08-13
10361127 Vertical transport FET with two or more gate lengths Gauri Karve, Fee Li Lie, Indira Seshadri, Mona A. Ebrish, Leigh Anne H. Clevenger +1 more 2019-07-23
10312140 Dielectric gap fill evaluation for integrated circuits Isabel Cristina Chu, Lawrence A. Clevenger, Leigh Anne H. Clevenger, Ekmini Anuja De Silva, Gauri Karve +3 more 2019-06-04
10249533 Method and structure for forming a replacement contact Jeffrey C. Shearer, John R. Sporre, Hyung Joo Shin 2019-04-02
10229854 FinFET gate cut after dummy gate removal John R. Sporre, Siva Kanakasabapathy, Andrew M. Greene, Jeffrey C. Shearer 2019-03-12
10229910 Separate N and P fin etching for reduced CMOS device leakage Isabel Cristina Chu, Lawrence A. Clevenger, Leigh Anne H. Clevenger, Mona A. Ebrish, Gauri Karve +3 more 2019-03-12
10211151 Enhanced self-alignment of vias for asemiconductor device Benjamin D. Briggs, Lawrence A. Clevenger, Bartlet H. DeProspo, Michael Rizzolo 2019-02-19
10121661 Self aligned pattern formation post spacer etchback in tight pitch configurations Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Nelson Felix, Sivananda K. Kanakasabapathy +2 more 2018-11-06
10083864 Self aligned conductive lines with relaxed overlay Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Sivananda K. Kanakasabapathy, Yann Mignot +2 more 2018-09-25
10056290 Self-aligned pattern formation for a semiconductor device Sean D. Burns, Lawrence A. Clevenger, Nelson Felix, Sivananda K. Kanakasabapathy, Christopher J. Penny 2018-08-21
9991156 Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogs Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Sivananda K. Kanakasabapathy, Yann Mignot +2 more 2018-06-05
9972533 Aligning conductive vias with trenches Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Sivananda K. Kanakasabapathy, Yann Mignot +2 more 2018-05-15
9934970 Self aligned pattern formation post spacer etchback in tight pitch configurations Sean D. Burns, Lawrence A. Clevenger, Matthew E. Colburn, Nelson Felix, Sivananda K. Kanakasabapathy +2 more 2018-04-03