MR

Michael Rizzolo

IBM: 193 patents #171 of 70,183Top 1%
TE Tessera: 6 patents #80 of 271Top 30%
AS Adeia Semiconductor Solutions: 2 patents #9 of 57Top 20%
📍 Albany, NY: #2 of 790 inventorsTop 1%
🗺 New York: #145 of 115,490 inventorsTop 1%
Overall (All Time): #3,319 of 4,157,543Top 1%
201
Patents All Time

Issued Patents All Time

Showing 101–125 of 201 patents

Patent #TitleCo-InventorsDate
10629529 Semiconductor device including a porous dielectric layer, and method of forming the semiconductor device Benjamin D. Briggs, Lawrence A. Clevenger, Bartlet H. DeProspo, Huai Huang, Christopher J. Penny 2020-04-21
10622406 Dual metal nitride landing pad for MRAM devices Alexander Reznicek, Oscar van der Straten 2020-04-14
10615119 Back end of line electrical fuse structure and method of fabrication Benjamin D. Briggs, Lawrence A. Clevenger, Chih-Chao Yang 2020-04-07
10606231 Computer-mediated reality including physical damping feedback Benjamin D. Briggs, Lawrence A. Clevenger, Leigh Anne H. Clevenger, Christopher J. Penny, Aldis Sipolins 2020-03-31
10593506 Fold over emitter and collector field emission transistor Benjamin D. Briggs, Lawrence A. Clevenger 2020-03-17
10586767 Hybrid BEOL metallization utilizing selective reflection mask Benjamin D. Briggs, Cornelius Brown Peethala, Koichi Motoyama, Gen Tsutsui, Ruqiang Bao +2 more 2020-03-10
10585998 Automated method for integrated analysis of back end of the line yield, line resistance/capacitance and process performance Prasad Bhosale, Chih-Chao Yang 2020-03-10
10580740 Low-temperature diffusion doping of copper interconnects independent of seed layer composition Benjamin D. Briggs, Lawrence A. Clevenger, Chao-Kun Hu, Takeshi Nogami, Deepika Priyadarshini 2020-03-03
10559498 Location-specific laser annealing to improve interconnect microstructure Benjamin D. Briggs, Lawrence A. Clevenger, Bartlet H. DeProspo 2020-02-11
10546892 Resistive memory device with meshed electrodes Takashi Ando, Lawrence A. Clevenger, Chih-Chao Yang 2020-01-28
10545806 Proximity correction in three-dimensional manufacturing Benjamin D. Briggs, Lawrence A. Clevenger, Leigh Anne H. Clevenger, Christopher J. Penny, Aldis Sipolins 2020-01-28
10541206 Interconnect structure including air gaps enclosed between conductive lines and a permeable dielectric layer Benjamin D. Briggs, Lawrence A. Clevenger, Christopher J. Penny 2020-01-21
10529662 Method and structure to construct cylindrical interconnects to reduce resistance Benjamin D. Briggs, Christopher J. Penny, Huai Huang, Lawrence A. Clevenger, Hosadurga Shobha 2020-01-07
10529621 Modulating the microstructure of metallic interconnect structures Roger A. Quon, Chih-Chao Yang 2020-01-07
10515903 Selective CVD alignment-mark topography assist for non-volatile memory Chih-Chao Yang, Lawrence A. Clevenger, Benjamin D. Briggs 2019-12-24
10515894 Enhanced self-alignment of vias for a semiconductor device Benjamin D. Briggs, Lawrence A. Clevenger, Bartlet H. DeProspo, Nicole Saulnier 2019-12-24
10492019 Binaural audio calibration Benjamin D. Briggs, Lawrence A. Clevenger, Leigh Anne H. Clevenger, Christopher J. Penny, Aldis Sipolins 2019-11-26
10461248 Bottom electrode for MRAM applications Prasad Bhosale, Raghuveer R. Patlolla, Chih-Chao Yang 2019-10-29
10446496 Self-forming barrier for cobalt interconnects Benjamin D. Briggs, Lawrence A. Clevenger, Takeshi Nogami 2019-10-15
10431544 Self-forming barrier for cobalt interconnects Benjamin D. Briggs, Lawrence A. Clevenger, Takeshi Nogami 2019-10-01
10431116 Orator effectiveness through real-time feedback system with automatic detection of human behavioral and emotional states of orator and audience Benjamin D. Briggs, Lawrence A. Clevenger, Leigh Anne H. Clevenger, Jonathan H. Connell, II, Nalini K. Ratha 2019-10-01
10424456 Fold over emitter and collector field emission transistor Benjamin D. Briggs, Lawrence A. Clevenger 2019-09-24
10404306 Paint on micro chip touch screens Maryam Ashoori, Benjamin D. Briggs, Justin A. Canaperi, Lawrence A. Clevenger, Leigh Anne H. Clevenger +1 more 2019-09-03
10395986 Fully aligned via employing selective metal deposition Benjamin D. Briggs, James J. Kelly, Donald F. Canaperi, Lawrence A. Clevenger 2019-08-27
10395977 Self aligned via and pillar cut for at least a self aligned double pitch Benjamin D. Briggs, Lawrence A. Clevenger, Terry A. Spooner, Theodorus E. Standaert 2019-08-27