Issued Patents All Time
Showing 26–50 of 112 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7095474 | Patterns of electrically conducting polymers and their application as electrodes or electrical contacts | Christos D. Dimitrakopoulos, Bruce K. Furman, Teresita O. Graham, Shui-Chih Lien | 2006-08-22 |
| 6979518 | Attenuated embedded phase shift photomask blanks | Katherina Babich, S. Jay Chey, Michael S. Hibbs, Robert N. Lang, Arpan Mahorowala +1 more | 2005-12-27 |
| 6967236 | Methods of processing and synthesizing electrically conductive polymers and precursors thereof to form electrically conductive polymers having high electrical conductivity | Yun-Hsin Liao | 2005-11-22 |
| 6939664 | Low-activation energy silicon-containing resist system | Wu-Song Huang, Robert David Allen, Ranee W. Kwong, Ratnam Sooriyakumaran | 2005-09-06 |
| 6858357 | Attenuated embedded phase shift photomask blanks | Katherina Babich, Cameron Brooks, S. Jay Chey, C. Richard Guarnieri, Michael S. Hibbs +1 more | 2005-02-22 |
| 6830708 | Water-soluble electrically conducting polymers, their synthesis and use | Jeffrey D. Gelorme, Thomas H. Newman, Niranjan M. Patel, David E. Seeger | 2004-12-14 |
| 6821718 | Radiation sensitive silicon-containing negative resists and use thereof | Ari Aviram, Wu-Song Huang, Ranee W. Kwong, Robert N. Lang, Qinghuang Lin +1 more | 2004-11-23 |
| 6806349 | Methods of fabrication of deaggregated electrically conductive polymers and precursors thereof | Bruce K. Furman | 2004-10-19 |
| 6752935 | Deaggregated electrically conductive polymers and precursors thereof | Bruce K. Furman | 2004-06-22 |
| 6746770 | Electrically conductive and abrasion/scratch resistant polymeric materials, method of fabrication thereof and uses thereof | Ali Afzali-Ardakani, Jack A. Dickerson, Thomas Baird Pillsbury, Karl J. Puttlitz, Jane M. Shaw +1 more | 2004-06-08 |
| 6730454 | Antireflective SiO-containing compositions for hardmask layer | Dirk Pfeiffer, Katherina Babich, Phillip Brock, Wu-Song Huang, Arpan Mahorowala +2 more | 2004-05-04 |
| 6730445 | Attenuated embedded phase shift photomask blanks | Katherina Babich, S. Jay Chey, Michael S. Hibbs, Robert N. Lang, Arpan Mahorowala +1 more | 2004-05-04 |
| 6685853 | Energy sensitive electrically conductive admixtures, uses thereof, methods of fabrication and structures fabricated therewith | Edward D. Babich, Inna V. Babich, Kuang-Jung Chen, Wayne M. Moreau, David E. Seeger | 2004-02-03 |
| 6686124 | Multifunctional polymeric materials and use thereof | Katherina Babich, David R. Medeiros, Wayne M. Moreau | 2004-02-03 |
| 6682860 | Attenuated embedded phase shift photomask blanks | Katherina Babich, S. Jay Chey, Michael S. Hibbs, Robert N. Lang, Arpan Mahorowala +1 more | 2004-01-27 |
| 6653045 | Radiation sensitive silicon-containing negative resists and use thereof | Ari Aviram, Wu-Song Huang, Ranee W. Kwong, Robert N. Lang, Qinghuang Lin +1 more | 2003-11-25 |
| 6653027 | Attenuated embedded phase shift photomask blanks | Katherina Babich, Cameron Brooks, S. Jay Chey, C. Richard Guarnieri, Michael S. Hibbs +1 more | 2003-11-25 |
| 6617086 | Forming a pattern of a negative photoresist | Edward D. Babich, Inna V. Babich, Katherina Babich, James J. Bucchignano, Karen E. Petrillo +1 more | 2003-09-09 |
| 6616863 | Plasticized, antiplasticized and crystalline conducting polymers and precursors thereof | Yun-Hsin Liao, Ravi F. Saraf | 2003-09-09 |
| 6586156 | Etch improved resist systems containing acrylate (or methacrylate) silane monomers | Wu-Song Huang, Dai Junyan, Ranee W. Kwong, Robert N. Lang, Arpan Mahorowala +3 more | 2003-07-01 |
| 6543617 | Packaged radiation sensitive coated workpiece process for making and method of storing same | Wu-Song Huang, Ranee W. Kwong, David R. Medeiros, Wayne M. Moreau, Karen E. Petrillo +2 more | 2003-04-08 |
| 6514667 | Tunable vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and applications thereof | Katherina Babich, Alfred Grill, Scott D. Halle, Arpan Mahorowala, Vishnubhai V. Patel | 2003-02-04 |
| 6503692 | Antireflective silicon-containing compositions as hardmask layer | Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee W. Kwong, Wayne M. Moreau | 2003-01-07 |
| 6458907 | Organometallic polymers and use thereof | Ari Aviram, C. Richard Guarnieri, Ranee W. Kwong | 2002-10-01 |
| 6436605 | Plasma resistant composition and use thereof | Ari Aviram, Edward D. Babich, Timothy A. Brunner, Thomas B. Faure, C. Richard Guarnieri +2 more | 2002-08-20 |