Issued Patents All Time
Showing 126–150 of 190 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8779525 | Method for growing strain-inducing materials in CMOS circuits in a gate first flow | Bo Bai, Linda Black, Abhishek Dube, Viorel Ontalus, Kathryn T. Schonenberg +2 more | 2014-07-15 |
| 8716037 | Measurement of CMOS device channel strain by X-ray diffraction | Thomas N. Adam, Stephen W. Bedell, Eric C. Harley, Anita Madan, Conal E. Murray +1 more | 2014-05-06 |
| 8652892 | Implant damage control by in-situ C doping during sige epitaxy for device applications | Jin Ping Liu | 2014-02-18 |
| 8642434 | Structure and method for mobility enhanced MOSFETS with unalloyed silicide | Yaocheng Liu, Dureseti Chidambarrao, Oleg Gluschenkov, Renee T. Mo, Kern Rim | 2014-02-04 |
| 8618617 | Field effect transistor device | Kevin K. Chan, Abhishek Dube, Eric C. Harley, Viorel Ontalus, Kathryn T. Schonenberg +3 more | 2013-12-31 |
| 8598009 | Self-aligned embedded SiGe structure and method of manufacturing the same | Brian J. Greene, William K. Henson, Michael D. Steigerwalt, Kuldeep Amarnath, Rohit Pal +1 more | 2013-12-03 |
| 8575655 | Method and structure for PMOS devices with high K metal gate integration and SiGe channel engineering | Stephen W. Bedell, Ashima B. Chakravarti, Michael P. Chudzik, Dominic J. Schepis | 2013-11-05 |
| 8513718 | Stress enhanced transistor devices and methods of making | Johnathan E. Faltermeier, Xuefeng Hua | 2013-08-20 |
| 8492234 | Field effect transistor device | Kevin K. Chan, Abhishek Dube, Eric C. Harley, Viorel Ontalus, Kathryn T. Schonenberg +3 more | 2013-07-23 |
| 8450775 | Method to control source/drain stressor profiles for stress engineering | Yung Fu Chong, Zhijiong Luo | 2013-05-28 |
| 8440547 | Method and structure for PMOS devices with high K metal gate integration and SiGe channel engineering | Stephen W. Bedell, Ashima B. Chakravarti, Michael P. Chudzik, Dominic J. Schepis | 2013-05-14 |
| 8426265 | Method for growing strain-inducing materials in CMOS circuits in a gate first flow | Bo Bai, Linda Black, Abhishek Dube, Viorel Ontalus, Kathryn T. Schonenberg +2 more | 2013-04-23 |
| 8421191 | Monolayer dopant embedded stressor for advanced CMOS | Kevin K. Chan, Abhishek Dube, Jinghong Li, Joseph S. Newbury, Viorel Ontalus +2 more | 2013-04-16 |
| 8361859 | Stressed transistor with improved metastability | Thomas N. Adam, Stephen W. Bedell, Abhishek Dube, Eric C. Harley, Alexander Reznicek +4 more | 2013-01-29 |
| 8299535 | Delta monolayer dopants epitaxy for embedded source/drain silicide | Kevin K. Chan, Abhishek Dube, Jeffrey B. Johnson, Jinghong Li, Dae-Gyu Park +1 more | 2012-10-30 |
| 8288825 | Formation of raised source/drain structures in NFET with embedded SiGe in PFET | Yung Fu Chong, Zhijiong Luo, Joo-chan Kim | 2012-10-16 |
| 8236660 | Monolayer dopant embedded stressor for advanced CMOS | Kevin K. Chan, Abhishek Dube, Jinghong Li, Joseph S. Newbury, Viorel Ontalus +2 more | 2012-08-07 |
| 8232186 | Methods of integrating reverse eSiGe on NFET and SiGe channel on PFET, and related structure | Eric C. Harley, Dominic J. Schepis, Michael D. Steigerwalt, Linda Black, Rick Carter | 2012-07-31 |
| 8232172 | Stress enhanced transistor devices and methods of making | Thomas N. Adam, Thomas A. Wallner | 2012-07-31 |
| 8222673 | Self-aligned embedded SiGe structure and method of manufacturing the same | Brian J. Greene, William K. Henson, Michael D. Steigerwalt, Kuldeep Amarnath, Rohit Pal +1 more | 2012-07-17 |
| 8217423 | Structure and method for mobility enhanced MOSFETs with unalloyed silicide | Yaocheng Liu, Dureseti Chidambarrao, Oleg Gluschenkov, Renee T. Mo, Kern Rim | 2012-07-10 |
| 8216893 | Stress enhanced transistor devices and methods of making | Johnathan E. Faltermeier, Xuefeng Hua | 2012-07-10 |
| 8084788 | Method of forming source and drain of a field-effect-transistor and structure thereof | Abhishek Dube, Eric C. Harley, Shwu-Jen Jeng, Jeremy J. Kempisty, Hasan M. Nayfeh +1 more | 2011-12-27 |
| 8080451 | Fabricating semiconductor structures | Thomas N. Adam, Ashima B. Chakravarti, Eric C. Harley | 2011-12-20 |
| 8017487 | Method to control source/drain stressor profiles for stress engineering | Yung Fu Chong, Zhijiong Luo | 2011-09-13 |