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Self-aligned embedded SiGe structure and method of manufacturing the same |
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Eric C. Harley, Judson R. Holt, Dominic J. Schepis, Linda Black, Rick Carter |
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Self-aligned embedded SiGe structure and method of manufacturing the same |
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Ultra-thin SOI vertical bipolar transistors with an inversion collector on thin-buried oxide (BOX) for low substrate-bias operation and methods thereof |
Herbert L. Ho, Mahender Kumar, Qiqing C. Ouyang, Paul A. Papworth, Christopher D. Sheraw |
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Ultra-thin SOI vertical bipolar transistors with an inversion collector on thin-buried oxide (BOX) for low substrate-bias operation and methods thereof |
Herbert L. Ho, Mahender Kumar, Qiqing C. Ouyang, Paul A. Papworth, Christopher D. Sheraw |
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Vertical bipolar transistor with a majority carrier accumulation layer as a subcollector for SOI BiCMOS with reduced buried oxide thickness for low-substrate bias operation |
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Method of fabricating a vertical bipolar transistor with a majority carrier accumulation layer as a subcollector for SOI BiCMOS with reduced buried oxide thickness |
Herbert L. Ho, Mahender Kumar, Qiqing C. Ouyang, Paul A. Papworth, Christopher D. Sheraw |
2009-02-03 |
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STI formation in semiconductor device including SOI and bulk silicon regions |
Mahender Kumar, Herbert L. Ho, David M. Dobuzinsky, Johnathan E. Faltermeier, Denise Pendleton |
2008-07-01 |
| 7375410 |
Ultra-thin SOI vertical bipolar transistors with an inversion collector on thin-buried oxide (BOX) for low substrate-bias operation and methods thereof |
Herbert L. Ho, Mahender Kumar, Qiqing C. Ouyang, Paul A. Papworth, Christopher D. Sheraw |
2008-05-20 |
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STI formation in semiconductor device including SOI and bulk silicon regions |
Mahender Kumar, Herbert L. Ho, David M. Dobuzinsky, Johnathan E. Faltermeier, Denise Pendleton |
2006-10-10 |
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Patterning SOI with silicon mask to create box at different depths |
Devendra K. Sadana, Dominic J. Schepis |
2006-10-03 |
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Vertical bipolar transistor with a majority carrier accumulation layer as a subcollector for SOI BiCMOS with reduced buried oxide thickness for low-substrate bias operation |
Herbert L. Ho, Mahender Kumar, Qiqing C. Ouyang, Paul A. Papworth, Christopher D. Sheraw |
2006-10-03 |
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Method for deep trench etching through a buried insulator layer |
Herbert L. Ho, Mahender Kumar, Brian W. Messenger |
2006-02-07 |
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SOI trench capacitor cell incorporating a low-leakage floating body array transistor |
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Surface engineering to prevent epi growth on gate poly during selective epi processing |
Atul Ajmera, Dominic J. Schepis |
2005-05-31 |
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Surface engineering to prevent EPI growth on gate poly during selective EPI processing |
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2002-08-27 |