DG

Dario L. Goldfarb

IBM: 80 patents #845 of 70,183Top 2%
SC Shin-Etsu Chemical Co.: 2 patents #1,026 of 2,176Top 50%
Globalfoundries: 1 patents #2,221 of 4,424Top 55%
GU Globalfoundries U.S.: 1 patents #22 of 211Top 15%
📍 Dobbs Ferry, NY: #2 of 324 inventorsTop 1%
🗺 New York: #813 of 115,490 inventorsTop 1%
Overall (All Time): #21,612 of 4,157,543Top 1%
82
Patents All Time

Issued Patents All Time

Showing 51–75 of 82 patents

Patent #TitleCo-InventorsDate
8586283 Near-infrared absorbing film compositions Martin Glodde, Wu-Song Huang, Wai-Kin Li, Sen Liu, Pushkara R. Varanasi +1 more 2013-11-19
8536031 Method of fabricating dual damascene structures using a multilevel multiple exposure patterning scheme John C. Arnold, Kuang-Jung Chen, Matthew E. Colburn, Stefan Harrer, Steven J. Holmes +1 more 2013-09-17
8435719 Tunable contact angle process for immersionlithography topcoats and photoresists 2013-05-07
8395228 Integration process to improve focus leveling within a lot process variation Wai-Kin Li, Wu-Song Huang, Martin Glodde, Edward R. Engbrecht, Yiheng Xu 2013-03-12
8388758 Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid John P. Simons, Kenneth McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope +1 more 2013-03-05
8373271 Interconnect structure with an oxygen-doped SiC antireflective coating and method of fabrication Ranee W. Kwong, Qinghuang Lin, Deborah A. Neumayer, Hosadurga Shobha 2013-02-12
8354336 Forming an electrode having reduced corrosion and water decomposition on surface using an organic protective layer Ali Afzali-Ardakani, Shafaat Ahmed, Hariklia Deligianni, Stefan Harrer, Binquan Luan +6 more 2013-01-15
8293451 Near-infrared absorbing film compositions Martin Glodde, Wu-Song Huang, Wai-Kin Li, Sen Liu, Pushkara R. Varanasi +1 more 2012-10-23
8137874 Organic graded spin on BARC compositions for high NA lithography Libor Vyklicky, Sean D. Burns, David R. Medeiros, Daniel P. Sanders, Robert David Allen 2012-03-20
8124485 Molecular spacer layer for semiconductor oxide surface and high-K dielectric stack Hemanth Jagannathan, Dirk Pfeiffer 2012-02-28
8084193 Self-segregating multilayer imaging stack with built-in antireflective properties Joy Cheng, David R. Medeiros, Daniel P. Sanders, Dirk Pfeifer, Libor Vylicky 2011-12-27
8017303 Ultra low post exposure bake photoresist materials Mahmoud Khojasteh, Pushkara R. Varanasi 2011-09-13
7892705 Photomask and method of making thereof Sean D. Burns, Michael M. Crouse 2011-02-22
7869002 Reducing contamination in immersion lithography Dmitriy Shneyder, Raschid J. Bezama, Kafal Lai 2011-01-11
7816069 Graded spin-on organic antireflective coating for photolithography Colin J. Brodsky, Sean D. Burns, Michael Lercel, David R. Medeiros, Dirk Pfeiffer +3 more 2010-10-19
7807335 Immersion lithography contamination gettering layer Daniel A. Corliss, Dario Gil, Steven J. Holmes, David V. Horak, Kurt R. Kimmel +2 more 2010-10-05
7787101 Apparatus and method for reducing contamination in immersion lithography Raschid J. Bezama, Kafai Lai, Xiao Hi Liu, Dmitriy Shneyder 2010-08-31
7782445 Reducing contamination in immersion lithography Dmitriy Shneyder, Raschid J. Bezama, Kafal Lai 2010-08-24
7727708 Method for fabricating dual damascene structures Matthew E. Colburn 2010-06-01
7588879 Graded spin-on organic antireflective coating for photolithography Colin J. Brodsky, Sean D. Burns, Michael Lercel, David R. Medeiros, Dirk Pfeiffer +3 more 2009-09-15
7579137 Method for fabricating dual damascene structures Matthew E. Colburn 2009-08-25
7521172 Topcoat material and use thereof in immersion lithography processes Robert Allen David, Phillip Brock, Sean D. Burns, David R. Medeiros, Dirk Pfeiffer +3 more 2009-04-21
7446859 Apparatus and method for reducing contamination in immersion lithography Dmitriy Shneyder, Raschid J. Bezama, Kafai Lai 2008-11-04
7351348 Evaporation control using coating Daniel A. Corliss, Steven J. Holmes, Kurt R. Kimmel, Michael Lercel 2008-04-01
7332436 Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition John M. Cotte, Pamela Jones, Kenneth McCullough, Wayne M. Moreau, Keith R. Pope +2 more 2008-02-19